JPS57172731A - Position alignment device for mask substrate and wafer - Google Patents
Position alignment device for mask substrate and waferInfo
- Publication number
- JPS57172731A JPS57172731A JP56057906A JP5790681A JPS57172731A JP S57172731 A JPS57172731 A JP S57172731A JP 56057906 A JP56057906 A JP 56057906A JP 5790681 A JP5790681 A JP 5790681A JP S57172731 A JPS57172731 A JP S57172731A
- Authority
- JP
- Japan
- Prior art keywords
- alignment reference
- mask
- reference points
- substrate
- time interval
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To align the position by a method wherein the first and the second single color light are changed at the short time interval, synchronized to change the output signal of the photoelectric detector for the mask and the wafer detecting the mutual location of each alignment reference point. CONSTITUTION:The alignment reference points 2, 4 on the mask 1 and the substrate 3 are illuminated alternately at the short time interval by the single color light with the wave length of lambda1, lambda2 through the shutters 7, 10 synchrinized with the opening and closing of the switches 26, 27. The location of the Fresnel zone plate 11 and the distance between the mask 1 and the substrate 3 are selected to form the images of the alignment reference points 2, 4 on the receiving surface of the photoelectric detector 13. The resultant output is A/D converted 28 and alternately switched 26, 27 to collect the data on the mutual location. Besides, the alignment reference points may be provided on the locations exceeding three to arrange the Fresnel zone plate respectively corresponding to said points aligning the relative locations in the x, y, and z directions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56057906A JPS57172731A (en) | 1981-04-17 | 1981-04-17 | Position alignment device for mask substrate and wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56057906A JPS57172731A (en) | 1981-04-17 | 1981-04-17 | Position alignment device for mask substrate and wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57172731A true JPS57172731A (en) | 1982-10-23 |
Family
ID=13069024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56057906A Pending JPS57172731A (en) | 1981-04-17 | 1981-04-17 | Position alignment device for mask substrate and wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57172731A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6296804A (en) * | 1985-10-24 | 1987-05-06 | Shimadzu Corp | Measuring method of distance between two planes |
EP0715214A1 (en) * | 1994-11-29 | 1996-06-05 | Ushiodenki Kabushiki Kaisha | Process for positioning a mask relative to a workpiece and device for carrying out the process |
-
1981
- 1981-04-17 JP JP56057906A patent/JPS57172731A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6296804A (en) * | 1985-10-24 | 1987-05-06 | Shimadzu Corp | Measuring method of distance between two planes |
EP0715214A1 (en) * | 1994-11-29 | 1996-06-05 | Ushiodenki Kabushiki Kaisha | Process for positioning a mask relative to a workpiece and device for carrying out the process |
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