JPS57124352A - Phototype processing mask - Google Patents

Phototype processing mask

Info

Publication number
JPS57124352A
JPS57124352A JP20026181A JP20026181A JPS57124352A JP S57124352 A JPS57124352 A JP S57124352A JP 20026181 A JP20026181 A JP 20026181A JP 20026181 A JP20026181 A JP 20026181A JP S57124352 A JPS57124352 A JP S57124352A
Authority
JP
Japan
Prior art keywords
phototype
processing mask
mask
processing
phototype processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20026181A
Other languages
English (en)
Japanese (ja)
Inventor
Donarudo Buraisu Fuiritsupu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of JPS57124352A publication Critical patent/JPS57124352A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP20026181A 1980-12-17 1981-12-14 Phototype processing mask Pending JPS57124352A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21734280A 1980-12-17 1980-12-17

Publications (1)

Publication Number Publication Date
JPS57124352A true JPS57124352A (en) 1982-08-03

Family

ID=22810664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20026181A Pending JPS57124352A (en) 1980-12-17 1981-12-14 Phototype processing mask

Country Status (3)

Country Link
JP (1) JPS57124352A (de)
DE (1) DE3150056A1 (de)
GB (1) GB2089524B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968745A (ja) * 1982-09-01 1984-04-18 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Ｘ−線リトグラフイによりパタ−ンをラツカ−層に形成するマスクおよびその製造方法
JPS6365621A (ja) * 1986-09-05 1988-03-24 Nec Corp Ｘ線露光マスク

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3435177A1 (de) * 1983-09-26 1985-04-11 Canon K.K., Tokio/Tokyo Maske fuer lithographische zwecke
DE3339624A1 (de) * 1983-11-02 1985-05-09 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels roentgenstrahllithographie
DE3703582C1 (de) * 1987-02-06 1988-04-07 Heidenhain Gmbh Dr Johannes Bestrahlungsmaske zur lithographischen Erzeugung von Mustern
US5781607A (en) * 1996-10-16 1998-07-14 Ibm Corporation Membrane mask structure, fabrication and use

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (de) * 1973-09-17 1975-05-20
JPS5286778A (en) * 1976-01-14 1977-07-19 Toshiba Corp Mask aligning method for x-ray exposure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3963489A (en) * 1975-04-30 1976-06-15 Western Electric Company, Inc. Method of precisely aligning pattern-defining masks
DE2626851C3 (de) * 1976-06-15 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Masken für die Röntgenlithographie

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (de) * 1973-09-17 1975-05-20
JPS5286778A (en) * 1976-01-14 1977-07-19 Toshiba Corp Mask aligning method for x-ray exposure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968745A (ja) * 1982-09-01 1984-04-18 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Ｘ−線リトグラフイによりパタ−ンをラツカ−層に形成するマスクおよびその製造方法
JPS6365621A (ja) * 1986-09-05 1988-03-24 Nec Corp Ｘ線露光マスク

Also Published As

Publication number Publication date
DE3150056A1 (de) 1982-07-15
GB2089524B (en) 1984-12-05
GB2089524A (en) 1982-06-23

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