GB2089524B - High resolution lithographic process - Google Patents

High resolution lithographic process

Info

Publication number
GB2089524B
GB2089524B GB8136287A GB8136287A GB2089524B GB 2089524 B GB2089524 B GB 2089524B GB 8136287 A GB8136287 A GB 8136287A GB 8136287 A GB8136287 A GB 8136287A GB 2089524 B GB2089524 B GB 2089524B
Authority
GB
United Kingdom
Prior art keywords
high resolution
lithographic process
resolution lithographic
resolution
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8136287A
Other languages
English (en)
Other versions
GB2089524A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of GB2089524A publication Critical patent/GB2089524A/en
Application granted granted Critical
Publication of GB2089524B publication Critical patent/GB2089524B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB8136287A 1980-12-17 1981-12-02 High resolution lithographic process Expired GB2089524B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21734280A 1980-12-17 1980-12-17

Publications (2)

Publication Number Publication Date
GB2089524A GB2089524A (en) 1982-06-23
GB2089524B true GB2089524B (en) 1984-12-05

Family

ID=22810664

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8136287A Expired GB2089524B (en) 1980-12-17 1981-12-02 High resolution lithographic process

Country Status (3)

Country Link
JP (1) JPS57124352A (de)
DE (1) DE3150056A1 (de)
GB (1) GB2089524B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3232498A1 (de) * 1982-09-01 1984-03-01 Philips Patentverwaltung Gmbh, 2000 Hamburg Maske fuer die mustererzeugung in lackschichten mittels roentgenstrahllithographie und verfahren zu ihrer herstellung
DE3435177A1 (de) * 1983-09-26 1985-04-11 Canon K.K., Tokio/Tokyo Maske fuer lithographische zwecke
DE3339624A1 (de) * 1983-11-02 1985-05-09 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels roentgenstrahllithographie
JPS6365621A (ja) * 1986-09-05 1988-03-24 Nec Corp Ｘ線露光マスク
DE3703582C1 (de) * 1987-02-06 1988-04-07 Heidenhain Gmbh Dr Johannes Bestrahlungsmaske zur lithographischen Erzeugung von Mustern
US5781607A (en) * 1996-10-16 1998-07-14 Ibm Corporation Membrane mask structure, fabrication and use

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7412033A (nl) * 1973-09-17 1975-03-19 Siemens Ag Inrichting voor het justeren van halfgeleider- schijven ten opzichte van een bestralingsmasker, voor het vormen van een struktuur in fotolak door bestraling met roentgenstralen.
US3963489A (en) * 1975-04-30 1976-06-15 Western Electric Company, Inc. Method of precisely aligning pattern-defining masks
JPS5286778A (en) * 1976-01-14 1977-07-19 Toshiba Corp Mask aligning method for x-ray exposure
DE2626851C3 (de) * 1976-06-15 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Masken für die Röntgenlithographie

Also Published As

Publication number Publication date
DE3150056A1 (de) 1982-07-15
JPS57124352A (en) 1982-08-03
GB2089524A (en) 1982-06-23

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19921202