JPS57100727A - Correcting method for metal mask - Google Patents

Correcting method for metal mask

Info

Publication number
JPS57100727A
JPS57100727A JP17674780A JP17674780A JPS57100727A JP S57100727 A JPS57100727 A JP S57100727A JP 17674780 A JP17674780 A JP 17674780A JP 17674780 A JP17674780 A JP 17674780A JP S57100727 A JPS57100727 A JP S57100727A
Authority
JP
Japan
Prior art keywords
film
metal mask
defective
improper
metal pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17674780A
Other languages
Japanese (ja)
Inventor
Hayatoshi Tochiori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP17674780A priority Critical patent/JPS57100727A/en
Publication of JPS57100727A publication Critical patent/JPS57100727A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To effectively correct the defective improper part in a metal mask by forming a correcting metal pattern only on the defective improper part and its periphery of a metal pattern. CONSTITUTION:This method includes the steps of covering a metal mask 1 having a defective improper part 2 with a transparent conductive film 5, covering the film 5 with a positive transparent photosensitive material film 6 and removing the spot exposed part 7 of the positive transparent photosensitive material film surface on the defective improper part and its periphery. Subsequently, correcting metal pattern 8 is formed on the exposed film 5, and the film 5 and the film 6 except the necessary part are isolated from the metal mask.
JP17674780A 1980-12-15 1980-12-15 Correcting method for metal mask Pending JPS57100727A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17674780A JPS57100727A (en) 1980-12-15 1980-12-15 Correcting method for metal mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17674780A JPS57100727A (en) 1980-12-15 1980-12-15 Correcting method for metal mask

Publications (1)

Publication Number Publication Date
JPS57100727A true JPS57100727A (en) 1982-06-23

Family

ID=16019094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17674780A Pending JPS57100727A (en) 1980-12-15 1980-12-15 Correcting method for metal mask

Country Status (1)

Country Link
JP (1) JPS57100727A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0280131A2 (en) * 1987-02-27 1988-08-31 Hitachi, Ltd. Method of correcting defect in circuit pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0280131A2 (en) * 1987-02-27 1988-08-31 Hitachi, Ltd. Method of correcting defect in circuit pattern

Similar Documents

Publication Publication Date Title
GB2034526B (en) Method for forming an electrode pattern on a substrate
JPS57100727A (en) Correcting method for metal mask
JPS5461931A (en) Forming method of photo resist patterns
JPS57155539A (en) Mask
JPS6488546A (en) Method for exposing thick film resist
JPS5370764A (en) Electrode formation method by lift off method
JPS53147531A (en) Forming method for thin film pattern
JPS5652751A (en) Photomask correcting method
JPS55128832A (en) Method of making minute pattern
JPS57204123A (en) Forming method for resist stencil mask
JPS56100450A (en) Manufacture of projected electrode of semiconductor device
JPS5618420A (en) Manufacture of semiconductor device
JPS5689741A (en) Dryplate for photomasking
JPS649459A (en) Method for correcting white defect of photomask
JPS5574544A (en) Photo mask correcting method
JPS5670554A (en) Mask pattern correction method
JPS57153435A (en) Manufacture of semiconductor device
JPS5763912A (en) Electrode forming method
JPS5587148A (en) Correction method for light shielding mask
JPS5432978A (en) Correcting method for pattern
JPS52113679A (en) Sputter etching method
JPS56165244A (en) Manufacture of multilayer thin film electrode
JPS56157032A (en) Manufacture of element having minute pattern
JPS55113046A (en) Pattern forming method
JPS57112754A (en) Pinhole correcting method