JPS57100404A - Stripe filter - Google Patents

Stripe filter

Info

Publication number
JPS57100404A
JPS57100404A JP55177475A JP17747580A JPS57100404A JP S57100404 A JPS57100404 A JP S57100404A JP 55177475 A JP55177475 A JP 55177475A JP 17747580 A JP17747580 A JP 17747580A JP S57100404 A JPS57100404 A JP S57100404A
Authority
JP
Japan
Prior art keywords
refractive index
pass filter
green pass
lambda0
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55177475A
Other languages
Japanese (ja)
Other versions
JPS6332362B2 (en
Inventor
Hirotaka Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55177475A priority Critical patent/JPS57100404A/en
Publication of JPS57100404A publication Critical patent/JPS57100404A/en
Publication of JPS6332362B2 publication Critical patent/JPS6332362B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Abstract

PURPOSE:To decrease the number of layers of a green pass filter having the heat resistance, by putting >=2 spacer layers between a high refractive index layer and a low refractive index layer that form an interference filter. CONSTITUTION:The titanium dioxide T is used as a high refractive index material, and the optical film thickness is regulated to lambda0/4 and lambda0=530nm. The silicon dioxide S is used for a low refractive index material with the lambda4/4 optial film thickness. For instance, an overcoat layer 3 of silicon dioxide is formed on a green pass filter to prevent a big change of the spectral characteristics. With increase of the number of spacer layers, only the reflection factor of a reflective band increases with virtually no change of the band width. When the adverse etching method is used, the structure of the film used when a green pass filter is formed in directly turned into a stripe green pass filter.
JP55177475A 1980-12-16 1980-12-16 Stripe filter Granted JPS57100404A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55177475A JPS57100404A (en) 1980-12-16 1980-12-16 Stripe filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55177475A JPS57100404A (en) 1980-12-16 1980-12-16 Stripe filter

Publications (2)

Publication Number Publication Date
JPS57100404A true JPS57100404A (en) 1982-06-22
JPS6332362B2 JPS6332362B2 (en) 1988-06-29

Family

ID=16031560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55177475A Granted JPS57100404A (en) 1980-12-16 1980-12-16 Stripe filter

Country Status (1)

Country Link
JP (1) JPS57100404A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59147304A (en) * 1983-02-10 1984-08-23 Fuji Photo Optical Co Ltd Interference film filter having resistance to environment
JPS6098404A (en) * 1983-11-04 1985-06-01 Akai Electric Co Ltd Formation of surface protective film of dichroic mirror
EP1592067A1 (en) * 2004-01-15 2005-11-02 Matsushita Electric Industries Co., Ltd. Solid state imaging device, process for fabricating solid state imaging device and camera employing same
JP2006202778A (en) * 2005-01-17 2006-08-03 Matsushita Electric Ind Co Ltd Solid state imaging device and its fabrication process
WO2006100903A1 (en) * 2005-03-23 2006-09-28 Matsushita Electric Industrial Co., Ltd. On-vehicle imaging device
JP2006351800A (en) * 2005-06-15 2006-12-28 Matsushita Electric Ind Co Ltd Solid-state imaging device and camera
WO2007004355A1 (en) * 2005-07-06 2007-01-11 Matsushita Electric Industrial Co., Ltd. Process for producing solid-state image sensing device, solid-state image sensing device and camera
WO2007040170A1 (en) * 2005-10-04 2007-04-12 Matsushita Electric Industrial Co., Ltd. Vehicle mounted imaging apparatus
WO2007094092A1 (en) * 2006-02-15 2007-08-23 Matsushita Electric Industrial Co., Ltd. Solid state imaging device and camera
JP2008070437A (en) * 2006-09-12 2008-03-27 Matsushita Electric Ind Co Ltd Interference filter, liquid crystal display, electroluminescence display, and projection display device
JP2008170979A (en) * 2006-12-13 2008-07-24 Matsushita Electric Ind Co Ltd Solid-state imaging apparatus, manufacturing method therefor and camera

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59147304A (en) * 1983-02-10 1984-08-23 Fuji Photo Optical Co Ltd Interference film filter having resistance to environment
JPS6098404A (en) * 1983-11-04 1985-06-01 Akai Electric Co Ltd Formation of surface protective film of dichroic mirror
EP1592067A4 (en) * 2004-01-15 2007-05-02 Matsushita Electric Ind Co Ltd Solid state imaging device, process for fabricating solid state imaging device and camera employing same
EP1592067A1 (en) * 2004-01-15 2005-11-02 Matsushita Electric Industries Co., Ltd. Solid state imaging device, process for fabricating solid state imaging device and camera employing same
US7759679B2 (en) 2004-01-15 2010-07-20 Panasonic Corporation Solid-state imaging device, manufacturing method of solid-state imaging device, and camera employing same
JP2006202778A (en) * 2005-01-17 2006-08-03 Matsushita Electric Ind Co Ltd Solid state imaging device and its fabrication process
WO2006100903A1 (en) * 2005-03-23 2006-09-28 Matsushita Electric Industrial Co., Ltd. On-vehicle imaging device
JPWO2006100903A1 (en) * 2005-03-23 2008-08-28 松下電器産業株式会社 In-vehicle imaging device
US7560684B2 (en) 2005-03-23 2009-07-14 Panasonic Corporation On-vehicle imaging device
US7868286B2 (en) 2005-03-23 2011-01-11 Panasonic Corporation Mounted imaging device
JP2006351800A (en) * 2005-06-15 2006-12-28 Matsushita Electric Ind Co Ltd Solid-state imaging device and camera
WO2007004355A1 (en) * 2005-07-06 2007-01-11 Matsushita Electric Industrial Co., Ltd. Process for producing solid-state image sensing device, solid-state image sensing device and camera
WO2007040170A1 (en) * 2005-10-04 2007-04-12 Matsushita Electric Industrial Co., Ltd. Vehicle mounted imaging apparatus
US8022985B2 (en) 2005-10-04 2011-09-20 Panasonic Corporation Vehicle-mounted imaging device
JP4974897B2 (en) * 2005-10-04 2012-07-11 パナソニック株式会社 In-vehicle imaging device
WO2007094092A1 (en) * 2006-02-15 2007-08-23 Matsushita Electric Industrial Co., Ltd. Solid state imaging device and camera
JP2008070437A (en) * 2006-09-12 2008-03-27 Matsushita Electric Ind Co Ltd Interference filter, liquid crystal display, electroluminescence display, and projection display device
JP2008170979A (en) * 2006-12-13 2008-07-24 Matsushita Electric Ind Co Ltd Solid-state imaging apparatus, manufacturing method therefor and camera

Also Published As

Publication number Publication date
JPS6332362B2 (en) 1988-06-29

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