JPS5694750A - Heating treatment device - Google Patents
Heating treatment deviceInfo
- Publication number
- JPS5694750A JPS5694750A JP17279579A JP17279579A JPS5694750A JP S5694750 A JPS5694750 A JP S5694750A JP 17279579 A JP17279579 A JP 17279579A JP 17279579 A JP17279579 A JP 17279579A JP S5694750 A JPS5694750 A JP S5694750A
- Authority
- JP
- Japan
- Prior art keywords
- infrared ray
- treatment device
- thermoelectric couple
- heating treatment
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/16—Controlling or regulating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17279579A JPS5694750A (en) | 1979-12-28 | 1979-12-28 | Heating treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17279579A JPS5694750A (en) | 1979-12-28 | 1979-12-28 | Heating treatment device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5694750A true JPS5694750A (en) | 1981-07-31 |
JPS5745054B2 JPS5745054B2 (ja) | 1982-09-25 |
Family
ID=15948494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17279579A Granted JPS5694750A (en) | 1979-12-28 | 1979-12-28 | Heating treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5694750A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56146227A (en) * | 1980-04-16 | 1981-11-13 | Hitachi Ltd | Heat treatment furnace |
JPS60228932A (ja) * | 1984-04-27 | 1985-11-14 | Komatsu Denshi Kinzoku Kk | 光加熱炉用温度測定装置 |
JPS62203424U (ja) * | 1986-06-13 | 1987-12-25 | ||
JPH0458527A (ja) * | 1990-06-28 | 1992-02-25 | Ebara Res Co Ltd | 洗浄方法 |
JPH05259146A (ja) * | 1992-03-09 | 1993-10-08 | Hitachi Ltd | 半導体製造装置 |
JPWO2019131791A1 (ja) * | 2017-12-27 | 2020-04-09 | 株式会社米倉製作所 | 赤外線焼成装置及びこれを用いた電子部品の焼成方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3623712A (en) * | 1969-10-15 | 1971-11-30 | Applied Materials Tech | Epitaxial radiation heated reactor and process |
JPS4842819U (ja) * | 1971-09-22 | 1973-06-01 | ||
JPS50147558U (ja) * | 1974-05-22 | 1975-12-08 |
-
1979
- 1979-12-28 JP JP17279579A patent/JPS5694750A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3623712A (en) * | 1969-10-15 | 1971-11-30 | Applied Materials Tech | Epitaxial radiation heated reactor and process |
JPS4842819U (ja) * | 1971-09-22 | 1973-06-01 | ||
JPS50147558U (ja) * | 1974-05-22 | 1975-12-08 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56146227A (en) * | 1980-04-16 | 1981-11-13 | Hitachi Ltd | Heat treatment furnace |
JPS6337494B2 (ja) * | 1980-04-16 | 1988-07-26 | Hitachi Ltd | |
JPS60228932A (ja) * | 1984-04-27 | 1985-11-14 | Komatsu Denshi Kinzoku Kk | 光加熱炉用温度測定装置 |
JPH047820B2 (ja) * | 1984-04-27 | 1992-02-13 | Komatsu Denshi Kinzoku Kk | |
JPS62203424U (ja) * | 1986-06-13 | 1987-12-25 | ||
JPH0458527A (ja) * | 1990-06-28 | 1992-02-25 | Ebara Res Co Ltd | 洗浄方法 |
JPH05259146A (ja) * | 1992-03-09 | 1993-10-08 | Hitachi Ltd | 半導体製造装置 |
JPWO2019131791A1 (ja) * | 2017-12-27 | 2020-04-09 | 株式会社米倉製作所 | 赤外線焼成装置及びこれを用いた電子部品の焼成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS5745054B2 (ja) | 1982-09-25 |
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