JPS5691423A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5691423A
JPS5691423A JP16812179A JP16812179A JPS5691423A JP S5691423 A JPS5691423 A JP S5691423A JP 16812179 A JP16812179 A JP 16812179A JP 16812179 A JP16812179 A JP 16812179A JP S5691423 A JPS5691423 A JP S5691423A
Authority
JP
Japan
Prior art keywords
blanking
aperture
deflector
beam exposure
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16812179A
Other languages
Japanese (ja)
Inventor
Akio Ito
Masahiro Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16812179A priority Critical patent/JPS5691423A/en
Publication of JPS5691423A publication Critical patent/JPS5691423A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the positional deviation and distortion of electron beams at the time of blanking by providing the first blanking deflector above the blanking aperture of an electron beam exposure device and providing the second and third blanking deflectors under the aperture. CONSTITUTION:The first blanking deflector 2 is provided between the first electron lens 1 and the blanking aperture 3 of an electron beam exposure device, and the second blanking deflector 4 and the third blanking deflector 5 are provided between the aperture 3 and the second electron lens 6 of the device. By the existence of these second and third deflectors, electron beams 9 deflected by the first deflector 2 are returned, after passing the blanking aperture 3, to the position and direction as if there were not the first blanking deflection, so that the positional deviation, the change of intensity distribution and the distortion of the electron beams occurring at the time of blanking can be prevented, the efficiency of deflection can be improved and a cut-off requiring high speed responsiveness can be carried out.
JP16812179A 1979-12-26 1979-12-26 Electron beam exposure device Pending JPS5691423A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16812179A JPS5691423A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16812179A JPS5691423A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5691423A true JPS5691423A (en) 1981-07-24

Family

ID=15862233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16812179A Pending JPS5691423A (en) 1979-12-26 1979-12-26 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5691423A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

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