JPS5684619A - Nonpolluting method of gas for semiconductor - Google Patents
Nonpolluting method of gas for semiconductorInfo
- Publication number
- JPS5684619A JPS5684619A JP16189779A JP16189779A JPS5684619A JP S5684619 A JPS5684619 A JP S5684619A JP 16189779 A JP16189779 A JP 16189779A JP 16189779 A JP16189779 A JP 16189779A JP S5684619 A JPS5684619 A JP S5684619A
- Authority
- JP
- Japan
- Prior art keywords
- inorg
- semiconductors
- salts
- aqueous alkali
- alkali hydroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Treating Waste Gases (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To remove harmful gases for semiconductors virtually perfectly by absorbing the gases for semiconductors by using a rotary type fine foam generator and using aqueous alkali hydroxide soln. contg. inorg. salts as absorbing liquid.
CONSTITUTION: Gases for semiconductors such as silane, arsine, and phosphine are absorbed and removed by using aqueous alkali hydroxide soln. contg. inorg. salts as absorbing liquid and using a rotary type fine foam generator. For example, 5.5l water is put into a "Rotary Atomizer Model TOPCA-L-2" and further 120g NaCl and 40g NaOH are put therein and these are dissolved. While a rotor is being rotated at 2,500 revolutions per minute, pure silane was introduced at the rate of 0.2W2.5l/min, but the phenomena such as explosion and combustion at the gas releasing port were not observed. Suitable concn. of inorg. salts in the absorbing liquid is 0.5W20wt%, and the suitable concn. of the aqueous alkali hydroxide soln. is 0.2W10.0wt%.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54161897A JPS6038968B2 (en) | 1979-12-12 | 1979-12-12 | Semiconductor gas abatement law |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54161897A JPS6038968B2 (en) | 1979-12-12 | 1979-12-12 | Semiconductor gas abatement law |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5684619A true JPS5684619A (en) | 1981-07-10 |
JPS6038968B2 JPS6038968B2 (en) | 1985-09-04 |
Family
ID=15744082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54161897A Expired JPS6038968B2 (en) | 1979-12-12 | 1979-12-12 | Semiconductor gas abatement law |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6038968B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5794323A (en) * | 1980-12-03 | 1982-06-11 | Stanley Electric Co Ltd | Treating method for waste gas of cvd apparatus |
JPS6142321A (en) * | 1984-08-06 | 1986-02-28 | Sony Corp | Apparatus for treating silane gas |
JPS6359337A (en) * | 1986-08-30 | 1988-03-15 | Furukawa Electric Co Ltd:The | Method and apparatus for treating exhaust gas |
JPS63236520A (en) * | 1987-03-24 | 1988-10-03 | Ube Ind Ltd | Harmful exhaust gas removing agent |
WO1995000805A1 (en) * | 1993-06-17 | 1995-01-05 | DAS-Dünnschicht Anlagen Systeme GmbH Dresden | Exhaust gas cleaning process and installation |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12006750B2 (en) | 2019-05-16 | 2024-06-11 | Sugatsune Kogyo Co., Ltd. | Hinge having damper and coil spring |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6038968A (en) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | Data transmission equipment |
-
1979
- 1979-12-12 JP JP54161897A patent/JPS6038968B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6038968A (en) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | Data transmission equipment |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5794323A (en) * | 1980-12-03 | 1982-06-11 | Stanley Electric Co Ltd | Treating method for waste gas of cvd apparatus |
JPS6142321A (en) * | 1984-08-06 | 1986-02-28 | Sony Corp | Apparatus for treating silane gas |
JPH0331085B2 (en) * | 1984-08-06 | 1991-05-02 | Sonii Kk | |
JPS6359337A (en) * | 1986-08-30 | 1988-03-15 | Furukawa Electric Co Ltd:The | Method and apparatus for treating exhaust gas |
JPS63236520A (en) * | 1987-03-24 | 1988-10-03 | Ube Ind Ltd | Harmful exhaust gas removing agent |
JPH0416211B2 (en) * | 1987-03-24 | 1992-03-23 | Ube Industries | |
WO1995000805A1 (en) * | 1993-06-17 | 1995-01-05 | DAS-Dünnschicht Anlagen Systeme GmbH Dresden | Exhaust gas cleaning process and installation |
Also Published As
Publication number | Publication date |
---|---|
JPS6038968B2 (en) | 1985-09-04 |
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