JPS5684618A - Method of removing harmful gas for semiconductor - Google Patents

Method of removing harmful gas for semiconductor

Info

Publication number
JPS5684618A
JPS5684618A JP16189679A JP16189679A JPS5684618A JP S5684618 A JPS5684618 A JP S5684618A JP 16189679 A JP16189679 A JP 16189679A JP 16189679 A JP16189679 A JP 16189679A JP S5684618 A JPS5684618 A JP S5684618A
Authority
JP
Japan
Prior art keywords
potassium permanganate
aqueous potassium
arsine
semiconductors
gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16189679A
Other languages
Japanese (ja)
Inventor
Tadashi Karaki
Yoshikazu Iketani
Tomoharu Najima
Kaoru Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON SANGYO GIJUTSU KK
Sumitomo Seika Chemicals Co Ltd
Original Assignee
NIPPON SANGYO GIJUTSU KK
Seitetsu Kagaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON SANGYO GIJUTSU KK, Seitetsu Kagaku Co Ltd filed Critical NIPPON SANGYO GIJUTSU KK
Priority to JP16189679A priority Critical patent/JPS5684618A/en
Publication of JPS5684618A publication Critical patent/JPS5684618A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To remove harmful gases for semiconductors virtually perfectly by absorbing the gases for semiconductors by using a rotary type fine foam generator and using an aqueous potassium permanganate soln. as absorbing liquid.
CONSTITUTION: Gases for semiconductors such as arsine, phosphine, and diborane are absorbed and removed by using an aqueous potassium permanganate as absorbing liquid and using a rorary type fine foam generator. For example, 3l aqueous potassium permanganate soln. of 2.0wt% is put into a "Rotary Atomizer Model TOPCA-L-2", and while a rotor is being rotated at 2,000W2,500rpm, an N2 gas contg. 100W20,000ppm arsine is introduced therein at the rate of 2W10l/min. The arsine concn. at the outlet is ≤0.5ppm. The suitable cocn. of the aqueous potassium permanganate is 0.2W5.0wt%.
COPYRIGHT: (C)1981,JPO&Japio
JP16189679A 1979-12-12 1979-12-12 Method of removing harmful gas for semiconductor Pending JPS5684618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16189679A JPS5684618A (en) 1979-12-12 1979-12-12 Method of removing harmful gas for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16189679A JPS5684618A (en) 1979-12-12 1979-12-12 Method of removing harmful gas for semiconductor

Publications (1)

Publication Number Publication Date
JPS5684618A true JPS5684618A (en) 1981-07-10

Family

ID=15744060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16189679A Pending JPS5684618A (en) 1979-12-12 1979-12-12 Method of removing harmful gas for semiconductor

Country Status (1)

Country Link
JP (1) JPS5684618A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175522A (en) * 1984-02-23 1985-09-09 World Giken:Kk Composition for treating waste gas during semiconductor manufacturing process
JPS61129026A (en) * 1984-11-27 1986-06-17 Nippon Paionikusu Kk Purification of exhaust gas
JPS6295119A (en) * 1985-10-21 1987-05-01 Nippon Chem Ind Co Ltd:The Method for removing gaseous hydride
JPS6359337A (en) * 1986-08-30 1988-03-15 Furukawa Electric Co Ltd:The Method and apparatus for treating exhaust gas
JPS63147518A (en) * 1986-08-12 1988-06-20 Nippon Chem Ind Co Ltd:The Method for cleaning air

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175522A (en) * 1984-02-23 1985-09-09 World Giken:Kk Composition for treating waste gas during semiconductor manufacturing process
JPS6331252B2 (en) * 1984-02-23 1988-06-23 Waarudo Giken Kk
JPS61129026A (en) * 1984-11-27 1986-06-17 Nippon Paionikusu Kk Purification of exhaust gas
JPH0457368B2 (en) * 1984-11-27 1992-09-11 Japan Pionics
JPS6295119A (en) * 1985-10-21 1987-05-01 Nippon Chem Ind Co Ltd:The Method for removing gaseous hydride
JPH0410367B2 (en) * 1985-10-21 1992-02-25
JPS63147518A (en) * 1986-08-12 1988-06-20 Nippon Chem Ind Co Ltd:The Method for cleaning air
JPS6359337A (en) * 1986-08-30 1988-03-15 Furukawa Electric Co Ltd:The Method and apparatus for treating exhaust gas

Similar Documents

Publication Publication Date Title
JPS5239568A (en) Process for removing dust sticked to inside of reactor
JPS5684618A (en) Method of removing harmful gas for semiconductor
JPS5252871A (en) Method of treating exhaust gas
JPS5684619A (en) Nonpolluting method of gas for semiconductor
JPS5342181A (en) Removing method for harmful gas
JPS51145483A (en) Method of producing adsorbing filter
JPS5326454A (en) Method of removing ammoniacal nitrogen from filthy water
JPS54101763A (en) Treating method for exhaust gas
JPS53137071A (en) Removing method for malodor
JPS51125669A (en) A method and arrangement for treating waste gas from urea granulating towers
JPS5522320A (en) Gas cleaning process
JPS5267036A (en) White-smoke preventing method
JPS51149165A (en) A process for decomposing ammonia gas
JPS5385806A (en) Process for removing hydrogen sulfide and carbon dioxide separately from gas mixture
JPS53142982A (en) Collecting method for mist formed in exhaust gas treating apparatus
JPS53117691A (en) Activated carbon regenerating and activating apparatus
JPS53117671A (en) Treating method for exhaust gas
JPS5276271A (en) Method and apparatus for making solution containing imidodisulfonic ac id harmless
JPS5567506A (en) Ozonizer protector
JPS5210855A (en) Process for removal of nitrogen oxides in exhaust gases containing oxy gen
JPS5230265A (en) Process for treatment of exhaust gases
JPS5493864A (en) Method of treating exhaust gas discharged from waste combusting furnace
JPS5222573A (en) Process for treatment of waste gases
JPS55147129A (en) Removing method of nicotine from air
JPS5224160A (en) Waste gas treatment process