JPS5684618A - Method of removing harmful gas for semiconductor - Google Patents
Method of removing harmful gas for semiconductorInfo
- Publication number
- JPS5684618A JPS5684618A JP16189679A JP16189679A JPS5684618A JP S5684618 A JPS5684618 A JP S5684618A JP 16189679 A JP16189679 A JP 16189679A JP 16189679 A JP16189679 A JP 16189679A JP S5684618 A JPS5684618 A JP S5684618A
- Authority
- JP
- Japan
- Prior art keywords
- potassium permanganate
- aqueous potassium
- arsine
- semiconductors
- gases
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To remove harmful gases for semiconductors virtually perfectly by absorbing the gases for semiconductors by using a rotary type fine foam generator and using an aqueous potassium permanganate soln. as absorbing liquid.
CONSTITUTION: Gases for semiconductors such as arsine, phosphine, and diborane are absorbed and removed by using an aqueous potassium permanganate as absorbing liquid and using a rorary type fine foam generator. For example, 3l aqueous potassium permanganate soln. of 2.0wt% is put into a "Rotary Atomizer Model TOPCA-L-2", and while a rotor is being rotated at 2,000W2,500rpm, an N2 gas contg. 100W20,000ppm arsine is introduced therein at the rate of 2W10l/min. The arsine concn. at the outlet is ≤0.5ppm. The suitable cocn. of the aqueous potassium permanganate is 0.2W5.0wt%.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16189679A JPS5684618A (en) | 1979-12-12 | 1979-12-12 | Method of removing harmful gas for semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16189679A JPS5684618A (en) | 1979-12-12 | 1979-12-12 | Method of removing harmful gas for semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5684618A true JPS5684618A (en) | 1981-07-10 |
Family
ID=15744060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16189679A Pending JPS5684618A (en) | 1979-12-12 | 1979-12-12 | Method of removing harmful gas for semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5684618A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60175522A (en) * | 1984-02-23 | 1985-09-09 | World Giken:Kk | Composition for treating waste gas during semiconductor manufacturing process |
JPS61129026A (en) * | 1984-11-27 | 1986-06-17 | Nippon Paionikusu Kk | Purification of exhaust gas |
JPS6295119A (en) * | 1985-10-21 | 1987-05-01 | Nippon Chem Ind Co Ltd:The | Method for removing gaseous hydride |
JPS6359337A (en) * | 1986-08-30 | 1988-03-15 | Furukawa Electric Co Ltd:The | Method and apparatus for treating exhaust gas |
JPS63147518A (en) * | 1986-08-12 | 1988-06-20 | Nippon Chem Ind Co Ltd:The | Method for cleaning air |
-
1979
- 1979-12-12 JP JP16189679A patent/JPS5684618A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60175522A (en) * | 1984-02-23 | 1985-09-09 | World Giken:Kk | Composition for treating waste gas during semiconductor manufacturing process |
JPS6331252B2 (en) * | 1984-02-23 | 1988-06-23 | Waarudo Giken Kk | |
JPS61129026A (en) * | 1984-11-27 | 1986-06-17 | Nippon Paionikusu Kk | Purification of exhaust gas |
JPH0457368B2 (en) * | 1984-11-27 | 1992-09-11 | Japan Pionics | |
JPS6295119A (en) * | 1985-10-21 | 1987-05-01 | Nippon Chem Ind Co Ltd:The | Method for removing gaseous hydride |
JPH0410367B2 (en) * | 1985-10-21 | 1992-02-25 | ||
JPS63147518A (en) * | 1986-08-12 | 1988-06-20 | Nippon Chem Ind Co Ltd:The | Method for cleaning air |
JPS6359337A (en) * | 1986-08-30 | 1988-03-15 | Furukawa Electric Co Ltd:The | Method and apparatus for treating exhaust gas |
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