JPS5648137A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5648137A JPS5648137A JP12518279A JP12518279A JPS5648137A JP S5648137 A JPS5648137 A JP S5648137A JP 12518279 A JP12518279 A JP 12518279A JP 12518279 A JP12518279 A JP 12518279A JP S5648137 A JPS5648137 A JP S5648137A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- rubber
- semiconductor elements
- wax
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- 238000005336 cracking Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000011259 mixed solution Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Dicing (AREA)
Abstract
PURPOSE:To easily obtain many semiconductor elements by applying sandblast to a semiconductor wafer by using cushion layers such as Si rubber or the like wherein a photo etching is applied. CONSTITUTION:A semiconductor wafer 10 having a P-N junction 14 and providing Al layers 15, 16 at both major surfaces is prepared. The Al layer 16 is sticked to a glass sheet 19 by wax 18 and Si rubber layers 26 are printed on the Al layer 15 by a mask 25. With SiC powders 23 blown from the upper part of the rubber layers 26, many semiconductor elements 1a having slopes 17a will be obtained. After etching cracking layers 24 with a mixed solution of hydrofluoric acid and nitric acid, the Si rubber 26 are melted and removed and the semiconductor elements 1a will be obtained by melting the wax 18. In this composition, manufacture is remarkably easy and the cost prices will be reduced compared to a conventional manufacturing method using a metal disc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12518279A JPS5648137A (en) | 1979-09-27 | 1979-09-27 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12518279A JPS5648137A (en) | 1979-09-27 | 1979-09-27 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5648137A true JPS5648137A (en) | 1981-05-01 |
Family
ID=14903921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12518279A Pending JPS5648137A (en) | 1979-09-27 | 1979-09-27 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5648137A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0669650A2 (en) * | 1994-02-22 | 1995-08-30 | Siemens Aktiengesellschaft | Container for semiconductor device and method for manufacturing |
JP2007299934A (en) * | 2006-04-28 | 2007-11-15 | Showa Denko Kk | Nitride-based semiconductor light emitting element, its fabrication process, and lamp |
JP2007299935A (en) * | 2006-04-28 | 2007-11-15 | Showa Denko Kk | Nitride-based semiconductor light emitting element, process for fabricating the same and lamp |
-
1979
- 1979-09-27 JP JP12518279A patent/JPS5648137A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0669650A2 (en) * | 1994-02-22 | 1995-08-30 | Siemens Aktiengesellschaft | Container for semiconductor device and method for manufacturing |
EP0669650A3 (en) * | 1994-02-22 | 1997-03-19 | Siemens Ag | Container for semiconductor device and method for manufacturing. |
JP2007299934A (en) * | 2006-04-28 | 2007-11-15 | Showa Denko Kk | Nitride-based semiconductor light emitting element, its fabrication process, and lamp |
JP2007299935A (en) * | 2006-04-28 | 2007-11-15 | Showa Denko Kk | Nitride-based semiconductor light emitting element, process for fabricating the same and lamp |
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