JPS5638362A - Preparation of coating solution for formation of high- purity silica film - Google Patents

Preparation of coating solution for formation of high- purity silica film

Info

Publication number
JPS5638362A
JPS5638362A JP11439879A JP11439879A JPS5638362A JP S5638362 A JPS5638362 A JP S5638362A JP 11439879 A JP11439879 A JP 11439879A JP 11439879 A JP11439879 A JP 11439879A JP S5638362 A JPS5638362 A JP S5638362A
Authority
JP
Japan
Prior art keywords
exchange resin
coating solution
reaction mixture
alkoxysilane
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11439879A
Other languages
Japanese (ja)
Other versions
JPS5739659B2 (en
Inventor
Toshihiro Nishimura
Mitsuaki Minato
Akira Hashimoto
Muneo Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Original Assignee
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO DENSHI KAGAKU KABUSHIKI, Tokyo Denshi Kagaku KK filed Critical TOKYO DENSHI KAGAKU KABUSHIKI
Priority to JP11439879A priority Critical patent/JPS5638362A/en
Publication of JPS5638362A publication Critical patent/JPS5638362A/en
Publication of JPS5739659B2 publication Critical patent/JPS5739659B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)

Abstract

PURPOSE: To obtain the titled coating solution efficiently, by reacting a halogenated silane or alkoxysilane with a carboxylic acid or water in an organic solvent in the presence of a catalyst, followed by treating the reaction mixture with an ion exchange resin.
CONSTITUTION: (A) A halogenated silane, e.g., silicon tetrachloride, etc. or alkoxysilane, e.g., methyl orthosilicate, etc. is reacted with (B) a carboxylic acid, e.g., glacial acetic acid, etc. or water in an organic solvent, e.g., methyl alcohol, etc. in the presence of a catalyst, e.g., hydrochloric acid, etc. to prepare a reaction mixture, which is treated with an ion exchange resin to give the desired coating solution. Preferably the above-mentioned reaction mixture is first treated with a strongly basic or weakly basic anion exchange resin and then with strongly acidic cation exchange resin.
USE: Usable for insulating film for electronic parts, protecting film for metal surface or plating surface, or oriented film for liquid crystal cell, etc.
COPYRIGHT: (C)1981,JPO&Japio
JP11439879A 1979-09-06 1979-09-06 Preparation of coating solution for formation of high- purity silica film Granted JPS5638362A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11439879A JPS5638362A (en) 1979-09-06 1979-09-06 Preparation of coating solution for formation of high- purity silica film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11439879A JPS5638362A (en) 1979-09-06 1979-09-06 Preparation of coating solution for formation of high- purity silica film

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9171781A Division JPS5774370A (en) 1981-06-15 1981-06-15 High-purity silica-forming coating solution

Publications (2)

Publication Number Publication Date
JPS5638362A true JPS5638362A (en) 1981-04-13
JPS5739659B2 JPS5739659B2 (en) 1982-08-23

Family

ID=14636674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11439879A Granted JPS5638362A (en) 1979-09-06 1979-09-06 Preparation of coating solution for formation of high- purity silica film

Country Status (1)

Country Link
JP (1) JPS5638362A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5774370A (en) * 1981-06-15 1982-05-10 Tokyo Denshi Kagaku Kabushiki High-purity silica-forming coating solution
JPS58189263A (en) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd Coating fluid for sio2 film formation
JPH03190929A (en) * 1989-12-04 1991-08-20 General Electric Co <Ge> Preparation of silicone oligomer by nonaqueous system
JPH04226572A (en) * 1990-06-29 1992-08-17 Ppg Ind Inc Hardwearing coating material composition and production thereof
KR101214091B1 (en) 2011-06-28 2012-12-20 주식회사 솔라메이트 Ester orgarnic silicon composition, orgarnic silicon polymer and methods of manufacturing them

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5774370A (en) * 1981-06-15 1982-05-10 Tokyo Denshi Kagaku Kabushiki High-purity silica-forming coating solution
JPS58189263A (en) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd Coating fluid for sio2 film formation
JPS6358867B2 (en) * 1982-04-28 1988-11-17
JPH03190929A (en) * 1989-12-04 1991-08-20 General Electric Co <Ge> Preparation of silicone oligomer by nonaqueous system
JPH04226572A (en) * 1990-06-29 1992-08-17 Ppg Ind Inc Hardwearing coating material composition and production thereof
KR101214091B1 (en) 2011-06-28 2012-12-20 주식회사 솔라메이트 Ester orgarnic silicon composition, orgarnic silicon polymer and methods of manufacturing them

Also Published As

Publication number Publication date
JPS5739659B2 (en) 1982-08-23

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