JPS5638362A - Preparation of coating solution for formation of high- purity silica film - Google Patents
Preparation of coating solution for formation of high- purity silica filmInfo
- Publication number
- JPS5638362A JPS5638362A JP11439879A JP11439879A JPS5638362A JP S5638362 A JPS5638362 A JP S5638362A JP 11439879 A JP11439879 A JP 11439879A JP 11439879 A JP11439879 A JP 11439879A JP S5638362 A JPS5638362 A JP S5638362A
- Authority
- JP
- Japan
- Prior art keywords
- exchange resin
- coating solution
- reaction mixture
- alkoxysilane
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Abstract
PURPOSE: To obtain the titled coating solution efficiently, by reacting a halogenated silane or alkoxysilane with a carboxylic acid or water in an organic solvent in the presence of a catalyst, followed by treating the reaction mixture with an ion exchange resin.
CONSTITUTION: (A) A halogenated silane, e.g., silicon tetrachloride, etc. or alkoxysilane, e.g., methyl orthosilicate, etc. is reacted with (B) a carboxylic acid, e.g., glacial acetic acid, etc. or water in an organic solvent, e.g., methyl alcohol, etc. in the presence of a catalyst, e.g., hydrochloric acid, etc. to prepare a reaction mixture, which is treated with an ion exchange resin to give the desired coating solution. Preferably the above-mentioned reaction mixture is first treated with a strongly basic or weakly basic anion exchange resin and then with strongly acidic cation exchange resin.
USE: Usable for insulating film for electronic parts, protecting film for metal surface or plating surface, or oriented film for liquid crystal cell, etc.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11439879A JPS5638362A (en) | 1979-09-06 | 1979-09-06 | Preparation of coating solution for formation of high- purity silica film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11439879A JPS5638362A (en) | 1979-09-06 | 1979-09-06 | Preparation of coating solution for formation of high- purity silica film |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9171781A Division JPS5774370A (en) | 1981-06-15 | 1981-06-15 | High-purity silica-forming coating solution |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5638362A true JPS5638362A (en) | 1981-04-13 |
JPS5739659B2 JPS5739659B2 (en) | 1982-08-23 |
Family
ID=14636674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11439879A Granted JPS5638362A (en) | 1979-09-06 | 1979-09-06 | Preparation of coating solution for formation of high- purity silica film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5638362A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5774370A (en) * | 1981-06-15 | 1982-05-10 | Tokyo Denshi Kagaku Kabushiki | High-purity silica-forming coating solution |
JPS58189263A (en) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | Coating fluid for sio2 film formation |
JPH03190929A (en) * | 1989-12-04 | 1991-08-20 | General Electric Co <Ge> | Preparation of silicone oligomer by nonaqueous system |
JPH04226572A (en) * | 1990-06-29 | 1992-08-17 | Ppg Ind Inc | Hardwearing coating material composition and production thereof |
KR101214091B1 (en) | 2011-06-28 | 2012-12-20 | 주식회사 솔라메이트 | Ester orgarnic silicon composition, orgarnic silicon polymer and methods of manufacturing them |
-
1979
- 1979-09-06 JP JP11439879A patent/JPS5638362A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5774370A (en) * | 1981-06-15 | 1982-05-10 | Tokyo Denshi Kagaku Kabushiki | High-purity silica-forming coating solution |
JPS58189263A (en) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | Coating fluid for sio2 film formation |
JPS6358867B2 (en) * | 1982-04-28 | 1988-11-17 | ||
JPH03190929A (en) * | 1989-12-04 | 1991-08-20 | General Electric Co <Ge> | Preparation of silicone oligomer by nonaqueous system |
JPH04226572A (en) * | 1990-06-29 | 1992-08-17 | Ppg Ind Inc | Hardwearing coating material composition and production thereof |
KR101214091B1 (en) | 2011-06-28 | 2012-12-20 | 주식회사 솔라메이트 | Ester orgarnic silicon composition, orgarnic silicon polymer and methods of manufacturing them |
Also Published As
Publication number | Publication date |
---|---|
JPS5739659B2 (en) | 1982-08-23 |
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