JPS5636653A - Photosensitive resin plate for relief - Google Patents

Photosensitive resin plate for relief

Info

Publication number
JPS5636653A
JPS5636653A JP11215979A JP11215979A JPS5636653A JP S5636653 A JPS5636653 A JP S5636653A JP 11215979 A JP11215979 A JP 11215979A JP 11215979 A JP11215979 A JP 11215979A JP S5636653 A JPS5636653 A JP S5636653A
Authority
JP
Japan
Prior art keywords
relief
photosensitive resin
film
thick
resin plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11215979A
Other languages
Japanese (ja)
Inventor
Izumi Sakamoto
Minoru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP11215979A priority Critical patent/JPS5636653A/en
Publication of JPS5636653A publication Critical patent/JPS5636653A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To control side etching, provide mechanical strength to a relief and enable minute clear printing by using relief printing composed of a matted polyester film as a support layer. CONSTITUTION:A negative is laid on a glass plate and covered with an about 12mu thick polyester film, and a photosensitive unsatd. polyester resing soln. is squeezed on the film in 700mu thickness with a doctor. A 250mu thick matted polyester film with an about 40mu thick EVA adhesive applied to the surface is then allowed to contact with the photosensitive resin layer as a support film to obtain a photosensitive resin plate. This resin plate is irradiated with ultraviolet rays for 3min from the glass plate side at 50cm distance from a 4kW high voltage mercury lamp, and the unexposed part is removed with an air knife to maunfacture a Mt. Fuji type relief faithfully following the negative and having 700mu relief height and 65 deg. shoulder angle.
JP11215979A 1979-08-31 1979-08-31 Photosensitive resin plate for relief Pending JPS5636653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11215979A JPS5636653A (en) 1979-08-31 1979-08-31 Photosensitive resin plate for relief

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11215979A JPS5636653A (en) 1979-08-31 1979-08-31 Photosensitive resin plate for relief

Publications (1)

Publication Number Publication Date
JPS5636653A true JPS5636653A (en) 1981-04-09

Family

ID=14579706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11215979A Pending JPS5636653A (en) 1979-08-31 1979-08-31 Photosensitive resin plate for relief

Country Status (1)

Country Link
JP (1) JPS5636653A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59501611A (en) * 1982-09-06 1984-09-06 ブダペステイ　ミユスザキ　エギエテム A circuit device that compensates for rapidly changing reactive currents in customer bus lines, especially those that generate upper harmonics.
JPS63121849A (en) * 1986-11-12 1988-05-25 Asahi Chem Ind Co Ltd Improved masking exposing method
JPH0253234U (en) * 1988-09-30 1990-04-17
JPH05195472A (en) * 1992-01-14 1993-08-03 Ookurashiyou Insatsu Kyokucho Device for preventing dew condensation on back surface of shower save-all and work scaffold disposed on produced paper in paper machine
EP2577400A1 (en) * 2010-06-04 2013-04-10 MacDermid Printing Solutions, LLC Method of producing a relief image from a liquid photopolymer resin

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59501611A (en) * 1982-09-06 1984-09-06 ブダペステイ　ミユスザキ　エギエテム A circuit device that compensates for rapidly changing reactive currents in customer bus lines, especially those that generate upper harmonics.
JPS63121849A (en) * 1986-11-12 1988-05-25 Asahi Chem Ind Co Ltd Improved masking exposing method
JPH0253234U (en) * 1988-09-30 1990-04-17
JPH05195472A (en) * 1992-01-14 1993-08-03 Ookurashiyou Insatsu Kyokucho Device for preventing dew condensation on back surface of shower save-all and work scaffold disposed on produced paper in paper machine
EP2577400A1 (en) * 2010-06-04 2013-04-10 MacDermid Printing Solutions, LLC Method of producing a relief image from a liquid photopolymer resin
EP2577400A4 (en) * 2010-06-04 2013-06-12 Macdermid Printing Solutions Method of producing a relief image from a liquid photopolymer resin
US8476000B2 (en) 2010-06-04 2013-07-02 Ryan Vest Method of producing a relief image from a liquid photopolymer resin

Similar Documents

Publication Publication Date Title
ATE24244T1 (en) PHOTOSENSITIVE MATERIAL FOR DRY TRANSFER.
EP0123153A3 (en) Plate making process using positive working presensitized plate
JPS5636653A (en) Photosensitive resin plate for relief
EP0152114A3 (en) Method for making a dry planographic printing plate
DE3563481D1 (en) Improvements relating to photolithography
JPS5734522A (en) Production of electrode substrate for liquid crystal display element
JPS5559466A (en) Lithographic printing plate without requiring dampening water
JPS5354239A (en) Method of bonding photosensitive flexographic plate and rubber backingmaterial
JPS5722242A (en) Waterless lithographic original plate for direct printing
JPS5742043A (en) Photosensitive material
FR2453433A1 (en) PROCESS FOR THE MANUFACTURE OF PLATES FOR FLAT PRINTING
AU583698B2 (en) Photosensitive lithographic printing plates
JPS5636652A (en) Photosensitive resin plate for relief
GB2020837A (en) Multi-layered Image Forming Construction Having a Release Layer
JPS576839A (en) Film cassette of camera for endoscope
JPS55153938A (en) Image forming material for contact reflection exposure
JPS55148112A (en) Manufacture of matrix by photosensitive resin
JPS54153631A (en) Relief image formation method
JPS5710138A (en) Manufacture of photoresist
JPS5799738A (en) Charged beam exposure method
JPS5790789A (en) Identification card
JPS5517163A (en) Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others
JPS5635137A (en) Photomask
JPS5550627A (en) Mask for lithography
JPS56128920A (en) Manufacture of electrode substrate for liquid-crystal display element