JPS5630726A - Outputting device of exposure data - Google Patents

Outputting device of exposure data

Info

Publication number
JPS5630726A
JPS5630726A JP10692579A JP10692579A JPS5630726A JP S5630726 A JPS5630726 A JP S5630726A JP 10692579 A JP10692579 A JP 10692579A JP 10692579 A JP10692579 A JP 10692579A JP S5630726 A JPS5630726 A JP S5630726A
Authority
JP
Japan
Prior art keywords
exposure
data
memory
pattern
memorized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10692579A
Other languages
Japanese (ja)
Other versions
JPS5759659B2 (en
Inventor
Katsuyuki Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Engineering Corp
Toshiba Corp
Original Assignee
Toshiba Engineering Corp
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Engineering Corp, Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Engineering Corp
Priority to JP10692579A priority Critical patent/JPS5630726A/en
Publication of JPS5630726A publication Critical patent/JPS5630726A/en
Publication of JPS5759659B2 publication Critical patent/JPS5759659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the memory capacity and to simplify the constitution of the device by a method wherein a logical difference data of an exposure pattern is stored in an outer memory and an operational processing is performed by reading out said data according to circumstances. CONSTITUTION:The logical difference data of the exposure patterns stored in the outer memory 11 is read out as the occasion may demand and it is written in an inner memory 14 of a computer 12. This data is sent to a logical operation section 15, where an OR operation is performed between said data and the data of the exposure pattern at present time, the data of the next exposure pattern is formed and it is memorized by the memory 16. The data memorized in the memory 16 is outputted to an electron exposure device 18, as an exposure data for a specific exposure unit cell, through an intermediate of a data transmission control device 17. The device 18 performs a desired pattern exposure for an exposure unit cell, for which an exposed material has been specified, in accordance with the above exposure data, and a repeated pattern exposure are performed for each exposure unit on the whole region of the exposed material.
JP10692579A 1979-08-22 1979-08-22 Outputting device of exposure data Granted JPS5630726A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10692579A JPS5630726A (en) 1979-08-22 1979-08-22 Outputting device of exposure data

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10692579A JPS5630726A (en) 1979-08-22 1979-08-22 Outputting device of exposure data

Publications (2)

Publication Number Publication Date
JPS5630726A true JPS5630726A (en) 1981-03-27
JPS5759659B2 JPS5759659B2 (en) 1982-12-15

Family

ID=14445983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10692579A Granted JPS5630726A (en) 1979-08-22 1979-08-22 Outputting device of exposure data

Country Status (1)

Country Link
JP (1) JPS5630726A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394772A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai System for compressing data in charged beam exposing device
JPS545665A (en) * 1977-06-15 1979-01-17 Fujitsu Ltd Electron beam exposure device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394772A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai System for compressing data in charged beam exposing device
JPS545665A (en) * 1977-06-15 1979-01-17 Fujitsu Ltd Electron beam exposure device

Also Published As

Publication number Publication date
JPS5759659B2 (en) 1982-12-15

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