JPS5629238A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS5629238A JPS5629238A JP10385179A JP10385179A JPS5629238A JP S5629238 A JPS5629238 A JP S5629238A JP 10385179 A JP10385179 A JP 10385179A JP 10385179 A JP10385179 A JP 10385179A JP S5629238 A JPS5629238 A JP S5629238A
- Authority
- JP
- Japan
- Prior art keywords
- image
- photomask
- plate
- layer
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To eliminate an effect of fine dust on a photomask, by rendering thickness of a thin glass plate and an adhesive layer not smaller than twice the focus depth of a light condenser. CONSTITUTION:Nonhardened transparent adhesives 3A is coated on photomask 6 having mask pattern 2 on transparent substrate 1, and transparent thin glass plate 4 is stuck to layer 3A with high flatness in a dustfree box to form a uniform film of layer 3A. At that time, the distance between the surface of pattern 2 and that of plate 4 is adjusted in 20-300mum. This lower limit is >= twice the focus depth of a light condenser in order to prevent an image of dust, when attached to plate 4 or an image of a small scratch, if any, from forming a projection pattern on a wafer surface by rendering the image vague due to light diffraction. The upper limit of said distance is required to provide light transmittance for practical use, thus permitting an influence of fine dust to be eliminated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10385179A JPS5629238A (en) | 1979-08-15 | 1979-08-15 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10385179A JPS5629238A (en) | 1979-08-15 | 1979-08-15 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5629238A true JPS5629238A (en) | 1981-03-24 |
JPS6154211B2 JPS6154211B2 (en) | 1986-11-21 |
Family
ID=14364936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10385179A Granted JPS5629238A (en) | 1979-08-15 | 1979-08-15 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5629238A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6257260U (en) * | 1985-09-26 | 1987-04-09 | ||
JPS62288842A (en) * | 1986-06-09 | 1987-12-15 | Tosoh Corp | Protective dustproof body for photomask reticle |
US6933082B2 (en) | 2001-11-08 | 2005-08-23 | Dai Nippon Printing Co., Ltd. | Photomask with dust-proofing device and exposure method using the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
US4131363A (en) * | 1977-12-05 | 1978-12-26 | International Business Machines Corporation | Pellicle cover for projection printing system |
JPS55121442A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
JPS55121443A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
-
1979
- 1979-08-15 JP JP10385179A patent/JPS5629238A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
US4131363A (en) * | 1977-12-05 | 1978-12-26 | International Business Machines Corporation | Pellicle cover for projection printing system |
JPS55121442A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
JPS55121443A (en) * | 1979-03-14 | 1980-09-18 | Mitsubishi Electric Corp | Photomask base plate |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6257260U (en) * | 1985-09-26 | 1987-04-09 | ||
JPS62288842A (en) * | 1986-06-09 | 1987-12-15 | Tosoh Corp | Protective dustproof body for photomask reticle |
US6933082B2 (en) | 2001-11-08 | 2005-08-23 | Dai Nippon Printing Co., Ltd. | Photomask with dust-proofing device and exposure method using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6154211B2 (en) | 1986-11-21 |
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