JPS5625734A - Photosensitive resin fixing method - Google Patents

Photosensitive resin fixing method

Info

Publication number
JPS5625734A
JPS5625734A JP10124379A JP10124379A JPS5625734A JP S5625734 A JPS5625734 A JP S5625734A JP 10124379 A JP10124379 A JP 10124379A JP 10124379 A JP10124379 A JP 10124379A JP S5625734 A JPS5625734 A JP S5625734A
Authority
JP
Japan
Prior art keywords
fixing
photosensitive resin
trichloroethane
soln
developed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10124379A
Other languages
Japanese (ja)
Inventor
Tsuneo Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP10124379A priority Critical patent/JPS5625734A/en
Publication of JPS5625734A publication Critical patent/JPS5625734A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To form a clear resist pattern without causing air pollution by fixing a photosensitive resin developed with 1,1,1-trichloroethane using a specified fixing soln. CONSTITUTION:A solvent development type photosensitive resin film such as a methyl methacrylate copolymer-base thin film on a substrate is imagewise exposed, developed with 1,1,1-trichloroethane, and fixed with a fixing soln. of a nonpolar nonconjugated compound such as ethylene tetrachloride, octane or fluorocarbon oil. The concn, of trichloroethane in the fixing soln. is gradually increased by repeating fixing, yet little influence is exerted on the power of the fixing soln.
JP10124379A 1979-08-10 1979-08-10 Photosensitive resin fixing method Pending JPS5625734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10124379A JPS5625734A (en) 1979-08-10 1979-08-10 Photosensitive resin fixing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10124379A JPS5625734A (en) 1979-08-10 1979-08-10 Photosensitive resin fixing method

Publications (1)

Publication Number Publication Date
JPS5625734A true JPS5625734A (en) 1981-03-12

Family

ID=14295456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10124379A Pending JPS5625734A (en) 1979-08-10 1979-08-10 Photosensitive resin fixing method

Country Status (1)

Country Link
JP (1) JPS5625734A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966030A (en) * 1982-09-17 1984-04-14 メルラン・ジエラン Breaker
JPS6149354A (en) * 1984-08-18 1986-03-11 松下電工株式会社 Power source switch
JPS61114431A (en) * 1984-09-27 1986-06-02 ラ　テレメカニク　エレクトリク Variable structure switching apparatus
JPS6229030A (en) * 1985-07-29 1987-02-07 イートン　コーポレイション Circuit danzokuki
JPS62119832A (en) * 1985-11-15 1987-06-01 ラ　テレメカニク　エレクトリク Contact breaker composed of electric magnet remote-controlling lead-in switch contact and means for transmitting armature movement with one point of this contact whose center is on displacement axis of magnet armature

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966030A (en) * 1982-09-17 1984-04-14 メルラン・ジエラン Breaker
JPH0338694B2 (en) * 1982-09-17 1991-06-11 Merlin Gerin
JPS6149354A (en) * 1984-08-18 1986-03-11 松下電工株式会社 Power source switch
JPH0429170B2 (en) * 1984-08-18 1992-05-18
JPS61114431A (en) * 1984-09-27 1986-06-02 ラ　テレメカニク　エレクトリク Variable structure switching apparatus
JPS6229030A (en) * 1985-07-29 1987-02-07 イートン　コーポレイション Circuit danzokuki
JPS62119832A (en) * 1985-11-15 1987-06-01 ラ　テレメカニク　エレクトリク Contact breaker composed of electric magnet remote-controlling lead-in switch contact and means for transmitting armature movement with one point of this contact whose center is on displacement axis of magnet armature

Similar Documents

Publication Publication Date Title
JPS56162744A (en) Formation of fine pattern
JPS5625734A (en) Photosensitive resin fixing method
JPS5525100A (en) Developing exposed print plate
EP0152114A3 (en) Method for making a dry planographic printing plate
JPS56137347A (en) Photosensitive composition for dry development
BR8107750A (en) PROCESS FOR OBTAINING COPIES IN RELIEF
JPS57106128A (en) Forming method for pattern
KR937000886A (en) Formation method of fine resist pattern
JPS5421271A (en) Pattern forming method
JPS56137632A (en) Pattern forming
JPS5639538A (en) Pattern forming method
JPS57112753A (en) Exposure method
JPS5559459A (en) Resist developing solution and developing method
JPS56155942A (en) Formation of fine pattern
JPS5748164A (en) Method and device for preparation of editing pattern figure
JPS56155939A (en) Resist material for forming fine pattern
JPS55138835A (en) Method of forming photoresist pattern
JPS57116338A (en) Far ultraviolet negative type resist material and formation of resist pattern using said material
JPS57212445A (en) Production of photomask
JPS541650A (en) Developing method of photographic materials
JPS642050A (en) Pattern forming method
JPS5465037A (en) Developing method for photosensitive resin by oxygen plasma
KR870002484A (en) Micro copy method
JPS5656630A (en) Manufacture of semiconductor element
JPS56160037A (en) Printing device