JPS56155939A - Resist material for forming fine pattern - Google Patents

Resist material for forming fine pattern

Info

Publication number
JPS56155939A
JPS56155939A JP5860280A JP5860280A JPS56155939A JP S56155939 A JPS56155939 A JP S56155939A JP 5860280 A JP5860280 A JP 5860280A JP 5860280 A JP5860280 A JP 5860280A JP S56155939 A JPS56155939 A JP S56155939A
Authority
JP
Japan
Prior art keywords
pattern
resist material
fine pattern
polymn
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5860280A
Other languages
Japanese (ja)
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5860280A priority Critical patent/JPS56155939A/en
Publication of JPS56155939A publication Critical patent/JPS56155939A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To prevent postpolymn. causing a change in the size of a pattern even if an exposure process after prebaking requires a long time by mixing a polymer having an allyl group as a member of each repeating unit with a specified polymn. inhibitor. CONSTITUTION:A resist material is obtd. by mixing a polymer such as polydiallyl o-phthalate having allyl groups as a member of each repeating unit with 0.01- 20wt% >=1 kinds of polymn. inhibitors selected from a substance holding stable free radicals, quinones, hydroquinones, allyl ether, 4-t-butylcatechil and dibutyltin dilaurate. Said resist material is applied to a substrate, prebaked, and irradiated to draw a prescribed pattern on the resist film. After developing the pattern the film is rinsed optionally and postbacked to form a fine pattern.
JP5860280A 1980-05-06 1980-05-06 Resist material for forming fine pattern Pending JPS56155939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5860280A JPS56155939A (en) 1980-05-06 1980-05-06 Resist material for forming fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5860280A JPS56155939A (en) 1980-05-06 1980-05-06 Resist material for forming fine pattern

Publications (1)

Publication Number Publication Date
JPS56155939A true JPS56155939A (en) 1981-12-02

Family

ID=13089056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5860280A Pending JPS56155939A (en) 1980-05-06 1980-05-06 Resist material for forming fine pattern

Country Status (1)

Country Link
JP (1) JPS56155939A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05158238A (en) * 1991-09-24 1993-06-25 Toppan Printing Co Ltd Method for preventing generation of development scum of electron beam crosslinking type resist
WO2008032617A1 (en) * 2006-09-13 2008-03-20 Nissan Chemical Industries, Ltd. Oligoaniline compound and use thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05158238A (en) * 1991-09-24 1993-06-25 Toppan Printing Co Ltd Method for preventing generation of development scum of electron beam crosslinking type resist
WO2008032617A1 (en) * 2006-09-13 2008-03-20 Nissan Chemical Industries, Ltd. Oligoaniline compound and use thereof
US8357770B2 (en) 2006-09-13 2013-01-22 Nissan Chemical Industries, Ltd. Oligoaniline compound and use thereof
JP5446267B2 (en) * 2006-09-13 2014-03-19 日産化学工業株式会社 Oligoaniline compounds and uses thereof

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