JPS5619622A - Photomask comparison inspecting mechanism - Google Patents

Photomask comparison inspecting mechanism

Info

Publication number
JPS5619622A
JPS5619622A JP9419979A JP9419979A JPS5619622A JP S5619622 A JPS5619622 A JP S5619622A JP 9419979 A JP9419979 A JP 9419979A JP 9419979 A JP9419979 A JP 9419979A JP S5619622 A JPS5619622 A JP S5619622A
Authority
JP
Japan
Prior art keywords
photomask
lenticles
masks
bases
ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9419979A
Other languages
Japanese (ja)
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9419979A priority Critical patent/JPS5619622A/en
Publication of JPS5619622A publication Critical patent/JPS5619622A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To automatically compare and collate the photomasks with reticules by matching the ratio in moving amount of a reticule carriage and a photomask carriage to magnification ratio of both patterns thereof. CONSTITUTION:Laser lights are irradiated through a mirror 34 to both reticules and masks on bases 22 and 24 respectively to optically convert the luminous intensities thereof through converters 44, 46 respectively and to amplify them through amplifiers 48, 50 respectively, to compare and collate therebetween by collator 52 to thus control drivers 26, 28 respectively of the bases 22, 24 respectively by a controller 54. First, the laser lights are sequentially reflected on the portions corresponding to the lenticles and the masks through a constant speed rotating mirror 60, and are introduced into the portions 56a-56b, 58a-58b of optical potentiometers 56, 58 respectively. Voltage signals produced from the potentiometers are applied to the controller 54, are converted from digital to analog to regulate the voltage level ratio so as to accurately match the magnification of the patterns of both the lenticles and the masks, again converted from analog to digital to drive the motors 26, 28 respectively so as to move the bases 22, 24 in dimensions T1, T2 respectively. In this configuration the contraction scale of the lenticle as the photomask can be compared and collated extremely accurately with the lenticles automatically.
JP9419979A 1979-07-26 1979-07-26 Photomask comparison inspecting mechanism Pending JPS5619622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9419979A JPS5619622A (en) 1979-07-26 1979-07-26 Photomask comparison inspecting mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9419979A JPS5619622A (en) 1979-07-26 1979-07-26 Photomask comparison inspecting mechanism

Publications (1)

Publication Number Publication Date
JPS5619622A true JPS5619622A (en) 1981-02-24

Family

ID=14103619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9419979A Pending JPS5619622A (en) 1979-07-26 1979-07-26 Photomask comparison inspecting mechanism

Country Status (1)

Country Link
JP (1) JPS5619622A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168228A (en) * 1982-08-24 1983-10-04 Fujitsu Ltd Comparison and inspection of photomask and apparatus thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168228A (en) * 1982-08-24 1983-10-04 Fujitsu Ltd Comparison and inspection of photomask and apparatus thereof
JPS632136B2 (en) * 1982-08-24 1988-01-18 Fujitsu Ltd

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