JPS5230428A - Photoresist exposure method - Google Patents
Photoresist exposure methodInfo
- Publication number
- JPS5230428A JPS5230428A JP50105927A JP10592775A JPS5230428A JP S5230428 A JPS5230428 A JP S5230428A JP 50105927 A JP50105927 A JP 50105927A JP 10592775 A JP10592775 A JP 10592775A JP S5230428 A JPS5230428 A JP S5230428A
- Authority
- JP
- Japan
- Prior art keywords
- exposure method
- photoresist exposure
- photoresist
- lights
- light absorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To provide a photoresist exposure method unaffected by reflected lights and diffracted lights and the like by using a light absorbent added photoresist.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50105927A JPS5230428A (en) | 1975-09-03 | 1975-09-03 | Photoresist exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50105927A JPS5230428A (en) | 1975-09-03 | 1975-09-03 | Photoresist exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5230428A true JPS5230428A (en) | 1977-03-08 |
Family
ID=14420478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50105927A Pending JPS5230428A (en) | 1975-09-03 | 1975-09-03 | Photoresist exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5230428A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56147146A (en) * | 1980-04-18 | 1981-11-14 | Fujitsu Ltd | Photoetching method |
JPS59193446A (en) * | 1983-04-18 | 1984-11-02 | Toyo Ink Mfg Co Ltd | Photosensitive laminate |
JPH01204044A (en) * | 1988-02-10 | 1989-08-16 | Nec Corp | Pattern forming method |
JPH06313968A (en) * | 1982-09-30 | 1994-11-08 | Brewer Sci Inc | Antireflection coating |
JPH07333855A (en) * | 1994-06-10 | 1995-12-22 | Mitsubishi Chem Corp | Antireflection coating composition and pattern forming method |
-
1975
- 1975-09-03 JP JP50105927A patent/JPS5230428A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56147146A (en) * | 1980-04-18 | 1981-11-14 | Fujitsu Ltd | Photoetching method |
JPH06313968A (en) * | 1982-09-30 | 1994-11-08 | Brewer Sci Inc | Antireflection coating |
JPH09120163A (en) * | 1982-09-30 | 1997-05-06 | Brewer Sci Inc | Antireflection coating |
JPS59193446A (en) * | 1983-04-18 | 1984-11-02 | Toyo Ink Mfg Co Ltd | Photosensitive laminate |
JPH01204044A (en) * | 1988-02-10 | 1989-08-16 | Nec Corp | Pattern forming method |
JPH07333855A (en) * | 1994-06-10 | 1995-12-22 | Mitsubishi Chem Corp | Antireflection coating composition and pattern forming method |
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