JPS5230428A - Photoresist exposure method - Google Patents

Photoresist exposure method

Info

Publication number
JPS5230428A
JPS5230428A JP50105927A JP10592775A JPS5230428A JP S5230428 A JPS5230428 A JP S5230428A JP 50105927 A JP50105927 A JP 50105927A JP 10592775 A JP10592775 A JP 10592775A JP S5230428 A JPS5230428 A JP S5230428A
Authority
JP
Japan
Prior art keywords
exposure method
photoresist exposure
photoresist
lights
light absorbent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50105927A
Other languages
Japanese (ja)
Inventor
Yasuo Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50105927A priority Critical patent/JPS5230428A/en
Publication of JPS5230428A publication Critical patent/JPS5230428A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To provide a photoresist exposure method unaffected by reflected lights and diffracted lights and the like by using a light absorbent added photoresist.
COPYRIGHT: (C)1977,JPO&Japio
JP50105927A 1975-09-03 1975-09-03 Photoresist exposure method Pending JPS5230428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50105927A JPS5230428A (en) 1975-09-03 1975-09-03 Photoresist exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50105927A JPS5230428A (en) 1975-09-03 1975-09-03 Photoresist exposure method

Publications (1)

Publication Number Publication Date
JPS5230428A true JPS5230428A (en) 1977-03-08

Family

ID=14420478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50105927A Pending JPS5230428A (en) 1975-09-03 1975-09-03 Photoresist exposure method

Country Status (1)

Country Link
JP (1) JPS5230428A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147146A (en) * 1980-04-18 1981-11-14 Fujitsu Ltd Photoetching method
JPS59193446A (en) * 1983-04-18 1984-11-02 Toyo Ink Mfg Co Ltd Photosensitive laminate
JPH01204044A (en) * 1988-02-10 1989-08-16 Nec Corp Pattern forming method
JPH06313968A (en) * 1982-09-30 1994-11-08 Brewer Sci Inc Antireflection coating
JPH07333855A (en) * 1994-06-10 1995-12-22 Mitsubishi Chem Corp Antireflection coating composition and pattern forming method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147146A (en) * 1980-04-18 1981-11-14 Fujitsu Ltd Photoetching method
JPH06313968A (en) * 1982-09-30 1994-11-08 Brewer Sci Inc Antireflection coating
JPH09120163A (en) * 1982-09-30 1997-05-06 Brewer Sci Inc Antireflection coating
JPS59193446A (en) * 1983-04-18 1984-11-02 Toyo Ink Mfg Co Ltd Photosensitive laminate
JPH01204044A (en) * 1988-02-10 1989-08-16 Nec Corp Pattern forming method
JPH07333855A (en) * 1994-06-10 1995-12-22 Mitsubishi Chem Corp Antireflection coating composition and pattern forming method

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