JPS56135808A - Manufacture of glass waveguide path for optical circuit - Google Patents
Manufacture of glass waveguide path for optical circuitInfo
- Publication number
- JPS56135808A JPS56135808A JP3900580A JP3900580A JPS56135808A JP S56135808 A JPS56135808 A JP S56135808A JP 3900580 A JP3900580 A JP 3900580A JP 3900580 A JP3900580 A JP 3900580A JP S56135808 A JPS56135808 A JP S56135808A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- core part
- glass
- substrate
- transparent glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
PURPOSE:To precisely control the sectional shape and dimensions of a core part and control the refractive index with high accuracy by forming a transparent glass layer on a glass substrate with grooves for the core part formed, removing the layer except the core part, and forming a transparent glass layer. CONSTITUTION:Thick metallic film 6 is formed on the smooth surface of glass substrate 5 and etched after a desired pattern. Using this film 6 as a mask substrate 5 is subjected to reactive sputter etching to form grooves for a core part, and residual film 6 is removed. Substrate 5 is then put in a reactor, and by feeding Si, Ge, P, B and Ti halides and O2 or steam, glass fine particle layer 7 is deposited and converted into transparent glass layer 8 by heating. After removing layer 8 except glass for the core part by etching, substrate 5 is put in a reactor, and by introducing Si, Ge, P, B and Ti halides, fluorides and O2, glass fine particle layer 9 is deposited and heated to form transparent glass layer 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3900580A JPS56135808A (en) | 1980-03-28 | 1980-03-28 | Manufacture of glass waveguide path for optical circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3900580A JPS56135808A (en) | 1980-03-28 | 1980-03-28 | Manufacture of glass waveguide path for optical circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56135808A true JPS56135808A (en) | 1981-10-23 |
Family
ID=12540996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3900580A Pending JPS56135808A (en) | 1980-03-28 | 1980-03-28 | Manufacture of glass waveguide path for optical circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56135808A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6187316A (en) * | 1984-10-05 | 1986-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of buried silicon film |
US4931077A (en) * | 1987-06-25 | 1990-06-05 | U.S. Philips Corp. | Method of manufacturing a planar optical component |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5223355A (en) * | 1975-08-18 | 1977-02-22 | Nippon Telegr & Teleph Corp <Ntt> | Process for fabricating a flush type light wave guiding path |
JPS5370839A (en) * | 1976-12-07 | 1978-06-23 | Fujitsu Ltd | Production of optical wave guide circuit |
-
1980
- 1980-03-28 JP JP3900580A patent/JPS56135808A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5223355A (en) * | 1975-08-18 | 1977-02-22 | Nippon Telegr & Teleph Corp <Ntt> | Process for fabricating a flush type light wave guiding path |
JPS5370839A (en) * | 1976-12-07 | 1978-06-23 | Fujitsu Ltd | Production of optical wave guide circuit |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6187316A (en) * | 1984-10-05 | 1986-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of buried silicon film |
US4931077A (en) * | 1987-06-25 | 1990-06-05 | U.S. Philips Corp. | Method of manufacturing a planar optical component |
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