JPS56125650A - Sample holding device - Google Patents
Sample holding deviceInfo
- Publication number
- JPS56125650A JPS56125650A JP2796980A JP2796980A JPS56125650A JP S56125650 A JPS56125650 A JP S56125650A JP 2796980 A JP2796980 A JP 2796980A JP 2796980 A JP2796980 A JP 2796980A JP S56125650 A JPS56125650 A JP S56125650A
- Authority
- JP
- Japan
- Prior art keywords
- shield body
- sample
- sputter particles
- sputter
- holding device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE:To make shielding against the leakage of sputter particles more perfect by providing an another shield body further on the outer side of a sputter particle shield body. CONSTITUTION:A shield body 8 for sputter particles 7 is provided freely removably in a manner as to enclose the neighborhood of a sample 5. The sample 5 is loaded in a fine adjusting mechanism 9. The shield body 8 for sputter particles 7 is supported by a supporting body 10 from the base plate part of the mechanism 9. Therefore, the shield body 8 is always held in the same position irrespective of the fine adjustment of the sample 5. The sputter particles 7 leaking through the hole parts of the shield body 8 are further shielded by the another shield body 11 installed freely removably adjacently to the inside wall of a sample chamber 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2796980A JPS56125650A (en) | 1980-03-07 | 1980-03-07 | Sample holding device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2796980A JPS56125650A (en) | 1980-03-07 | 1980-03-07 | Sample holding device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56125650A true JPS56125650A (en) | 1981-10-02 |
Family
ID=12235709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2796980A Pending JPS56125650A (en) | 1980-03-07 | 1980-03-07 | Sample holding device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56125650A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6420434A (en) * | 1987-07-15 | 1989-01-24 | Shimadzu Corp | Ion etching device |
WO2017021655A1 (en) * | 2015-08-03 | 2017-02-09 | Commissariat à l'énergie atomique et aux énergies alternatives | Method and device for the ion beam analysis of a sample |
FR3045153A1 (en) * | 2015-12-10 | 2017-06-16 | Commissariat Energie Atomique | METHOD AND DEVICE FOR SAMPLING A SAMPLE FROM AN IRRADIANT OBJECT |
-
1980
- 1980-03-07 JP JP2796980A patent/JPS56125650A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6420434A (en) * | 1987-07-15 | 1989-01-24 | Shimadzu Corp | Ion etching device |
WO2017021655A1 (en) * | 2015-08-03 | 2017-02-09 | Commissariat à l'énergie atomique et aux énergies alternatives | Method and device for the ion beam analysis of a sample |
FR3039899A1 (en) * | 2015-08-03 | 2017-02-10 | Commissariat Energie Atomique | METHOD AND DEVICE FOR ANALYZING A SAMPLE BY ION BEAM |
FR3045153A1 (en) * | 2015-12-10 | 2017-06-16 | Commissariat Energie Atomique | METHOD AND DEVICE FOR SAMPLING A SAMPLE FROM AN IRRADIANT OBJECT |
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