JPS6420434A - Ion etching device - Google Patents
Ion etching deviceInfo
- Publication number
- JPS6420434A JPS6420434A JP62177870A JP17787087A JPS6420434A JP S6420434 A JPS6420434 A JP S6420434A JP 62177870 A JP62177870 A JP 62177870A JP 17787087 A JP17787087 A JP 17787087A JP S6420434 A JPS6420434 A JP S6420434A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- vessel
- shielding member
- cylindrical shielding
- arrive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000992 sputter etching Methods 0.000 title 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- 229910052786 argon Inorganic materials 0.000 abstract 2
- -1 argon ions Chemical class 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 229910002804 graphite Inorganic materials 0.000 abstract 2
- 239000010439 graphite Substances 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 238000011109 contamination Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000012857 radioactive material Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE:To prevent the contamination by the secondary radioactive material generated except from a sample by utilizing a carbon graphite which has a low etching rate and ionization rate to prevent ions from coming into contact with the base and side walls of a vessel. CONSTITUTION:A bottomed cylindrical shielding member 3 formed of the carbon graphite is disposed in the lower part in the vessel. The gaseous argon ions A1, A5 biased from the sample S arrive at the base of the cylindrical shielding member 3 and the gaseous argon ions A2, A4 bounced from the surface of the sample S arrive at the peripheral wall of the cylindrical shielding member 3 and are so shielded as not to come into contact with the wall surface, etc., of the vessel 1. The cylindrical shielding member 3' enclosing ion beams is mounted to the exit port of an ion gun 2 to shield the spacing between the exit port and the side walls of the vessel 1. The evaporation or ionization of the elements except the sample S by receiving etching and the consequent hindrance of the analysis by vapor deposition on the sample S are, therefore, prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177870A JP2581695B2 (en) | 1987-07-15 | 1987-07-15 | Ion etching equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177870A JP2581695B2 (en) | 1987-07-15 | 1987-07-15 | Ion etching equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6420434A true JPS6420434A (en) | 1989-01-24 |
JP2581695B2 JP2581695B2 (en) | 1997-02-12 |
Family
ID=16038503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62177870A Expired - Lifetime JP2581695B2 (en) | 1987-07-15 | 1987-07-15 | Ion etching equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2581695B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6121943A (en) * | 1995-07-04 | 2000-09-19 | Denso Corporation | Electroluminescent display with constant current control circuits in scan electrode circuit |
JP2012156077A (en) * | 2011-01-28 | 2012-08-16 | Hitachi High-Technologies Corp | Ion milling apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54145592A (en) * | 1978-05-04 | 1979-11-13 | Mitsubishi Electric Corp | X-ray analyzer |
JPS56125650A (en) * | 1980-03-07 | 1981-10-02 | Hitachi Ltd | Sample holding device |
JPS61135460U (en) * | 1985-02-14 | 1986-08-23 |
-
1987
- 1987-07-15 JP JP62177870A patent/JP2581695B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54145592A (en) * | 1978-05-04 | 1979-11-13 | Mitsubishi Electric Corp | X-ray analyzer |
JPS56125650A (en) * | 1980-03-07 | 1981-10-02 | Hitachi Ltd | Sample holding device |
JPS61135460U (en) * | 1985-02-14 | 1986-08-23 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6121943A (en) * | 1995-07-04 | 2000-09-19 | Denso Corporation | Electroluminescent display with constant current control circuits in scan electrode circuit |
JP2012156077A (en) * | 2011-01-28 | 2012-08-16 | Hitachi High-Technologies Corp | Ion milling apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2581695B2 (en) | 1997-02-12 |
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