JPS56116035A - Washing method of photomask - Google Patents
Washing method of photomaskInfo
- Publication number
- JPS56116035A JPS56116035A JP1886480A JP1886480A JPS56116035A JP S56116035 A JPS56116035 A JP S56116035A JP 1886480 A JP1886480 A JP 1886480A JP 1886480 A JP1886480 A JP 1886480A JP S56116035 A JPS56116035 A JP S56116035A
- Authority
- JP
- Japan
- Prior art keywords
- washing
- water
- photomask
- soluble gas
- water soluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1886480A JPS56116035A (en) | 1980-02-18 | 1980-02-18 | Washing method of photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1886480A JPS56116035A (en) | 1980-02-18 | 1980-02-18 | Washing method of photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56116035A true JPS56116035A (en) | 1981-09-11 |
Family
ID=11983397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1886480A Pending JPS56116035A (en) | 1980-02-18 | 1980-02-18 | Washing method of photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56116035A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020029206A (ko) * | 2000-10-12 | 2002-04-18 | 윤종용 | 세정 가능한 파티클 펠리클 디텍터 박스 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56115538A (en) * | 1980-02-19 | 1981-09-10 | Toshiba Corp | Treating method for semiconductor patterning wafer |
-
1980
- 1980-02-18 JP JP1886480A patent/JPS56116035A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56115538A (en) * | 1980-02-19 | 1981-09-10 | Toshiba Corp | Treating method for semiconductor patterning wafer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020029206A (ko) * | 2000-10-12 | 2002-04-18 | 윤종용 | 세정 가능한 파티클 펠리클 디텍터 박스 |
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