JPS56116033A - Washing method for photomask - Google Patents

Washing method for photomask

Info

Publication number
JPS56116033A
JPS56116033A JP1885980A JP1885980A JPS56116033A JP S56116033 A JPS56116033 A JP S56116033A JP 1885980 A JP1885980 A JP 1885980A JP 1885980 A JP1885980 A JP 1885980A JP S56116033 A JPS56116033 A JP S56116033A
Authority
JP
Japan
Prior art keywords
washing
photomask
water
soluble gas
water soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1885980A
Other languages
Japanese (ja)
Inventor
Yoshimare Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1885980A priority Critical patent/JPS56116033A/en
Publication of JPS56116033A publication Critical patent/JPS56116033A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To decrease peeling of a pattern film during washing and prolong the service life of a photomask by washing the photomask with washing water in a water soluble gas atmosphere. CONSTITUTION:A photomask 1 of a chromium plate or the like used in the process for production of semiconductor devices is supported on a revolving shaft and is rotated within a horizontal plane, then a water soluble gas such as NH3 or CO2 is blown to the washing surface of the mask 1, and washing water such as pure water injected under high pressure from an injection nozzle 2, whereby the photomask is washed. Thereby, the static charge generated during the washing is neutralized by the water soluble gas ions and the effective washing which does not cause pattern peeling and resticking of fine particles of dust is accomplished.
JP1885980A 1980-02-18 1980-02-18 Washing method for photomask Pending JPS56116033A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1885980A JPS56116033A (en) 1980-02-18 1980-02-18 Washing method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1885980A JPS56116033A (en) 1980-02-18 1980-02-18 Washing method for photomask

Publications (1)

Publication Number Publication Date
JPS56116033A true JPS56116033A (en) 1981-09-11

Family

ID=11983259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1885980A Pending JPS56116033A (en) 1980-02-18 1980-02-18 Washing method for photomask

Country Status (1)

Country Link
JP (1) JPS56116033A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020029206A (en) * 2000-10-12 2002-04-18 윤종용 Cleanable particle pellicle detector box
KR100428337B1 (en) * 2001-10-18 2004-04-28 주식회사 이노벡스 El display processor for cleansing a shadow mask
CN111348306A (en) * 2018-12-21 2020-06-30 天津市泊鹤农业科技发展有限公司 A roll up membrane storage device for warmhouse booth

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162379A (en) * 1979-06-04 1980-12-17 Fujitsu Ltd Pure water washing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162379A (en) * 1979-06-04 1980-12-17 Fujitsu Ltd Pure water washing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020029206A (en) * 2000-10-12 2002-04-18 윤종용 Cleanable particle pellicle detector box
KR100428337B1 (en) * 2001-10-18 2004-04-28 주식회사 이노벡스 El display processor for cleansing a shadow mask
CN111348306A (en) * 2018-12-21 2020-06-30 天津市泊鹤农业科技发展有限公司 A roll up membrane storage device for warmhouse booth

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