JPS56113378A - Coater - Google Patents

Coater

Info

Publication number
JPS56113378A
JPS56113378A JP1587980A JP1587980A JPS56113378A JP S56113378 A JPS56113378 A JP S56113378A JP 1587980 A JP1587980 A JP 1587980A JP 1587980 A JP1587980 A JP 1587980A JP S56113378 A JPS56113378 A JP S56113378A
Authority
JP
Japan
Prior art keywords
rotary
coating
coater
spin
microwave generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1587980A
Other languages
Japanese (ja)
Inventor
Tadashi Kirisako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1587980A priority Critical patent/JPS56113378A/en
Publication of JPS56113378A publication Critical patent/JPS56113378A/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)

Abstract

PURPOSE: To bake a spin-on graph layer and the like within a short period after a rotary coating step at the same position, by constructing a coater with a rotary coating device and a heating microwave generator arranged on the rotary coating device.
CONSTITUTION: A coater is provided with a coating vessel 2 which slidably oscillates vertically through a stage 1, and a rotary stage 4 arranged at the central portion of the coating vessel 2 and fixed to a rotary shaft 3 extending through the coating vessel 2. The shaft 3 is also slidable vertically. The coater is also provided with a coating liquid dropping pipe 5, a purge gas feed pipe 6, a cover 8, a waveguide 11 and a microwave generator 12. The cover 8 has at its top surface a transparent window 7 made of glass, transparent glastics or the like capable of transmitting microwaves. A spin-on graph layer is formed in a uniform thickness on a substrate 13 to be treated, while rotating the rotary stage 4 at a high speed. The microwave generator 12 is then actuated to bake and solidify the spin-on graph layer by the radiation of 60W microwaves, for example, onto the substrate 13.
COPYRIGHT: (C)1981,JPO&Japio
JP1587980A 1980-02-12 1980-02-12 Coater Pending JPS56113378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1587980A JPS56113378A (en) 1980-02-12 1980-02-12 Coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1587980A JPS56113378A (en) 1980-02-12 1980-02-12 Coater

Publications (1)

Publication Number Publication Date
JPS56113378A true JPS56113378A (en) 1981-09-07

Family

ID=11901068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1587980A Pending JPS56113378A (en) 1980-02-12 1980-02-12 Coater

Country Status (1)

Country Link
JP (1) JPS56113378A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62160719A (en) * 1986-01-09 1987-07-16 Fuji Electric Co Ltd Impurity coating and dry processing method for semiconductor wafer
JPS63248471A (en) * 1987-04-03 1988-10-14 Tokyo Electron Ltd Coating device
CN103182359A (en) * 2011-12-28 2013-07-03 中国科学院微电子研究所 Microwave glue homogenizing equipment and method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5111826A (en) * 1974-07-20 1976-01-30 Dynic Corp Maikuroharyono tomakukeiseiho

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5111826A (en) * 1974-07-20 1976-01-30 Dynic Corp Maikuroharyono tomakukeiseiho

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62160719A (en) * 1986-01-09 1987-07-16 Fuji Electric Co Ltd Impurity coating and dry processing method for semiconductor wafer
JPS63248471A (en) * 1987-04-03 1988-10-14 Tokyo Electron Ltd Coating device
CN103182359A (en) * 2011-12-28 2013-07-03 中国科学院微电子研究所 Microwave glue homogenizing equipment and method thereof

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