JPS5585022A - Heat treating apparatus - Google Patents

Heat treating apparatus

Info

Publication number
JPS5585022A
JPS5585022A JP15748978A JP15748978A JPS5585022A JP S5585022 A JPS5585022 A JP S5585022A JP 15748978 A JP15748978 A JP 15748978A JP 15748978 A JP15748978 A JP 15748978A JP S5585022 A JPS5585022 A JP S5585022A
Authority
JP
Japan
Prior art keywords
tubes
furnace
furnace core
heat treating
treating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15748978A
Other languages
Japanese (ja)
Other versions
JPS626645B2 (en
Inventor
Hiroto Nagatomo
Tetsuya Takagaki
Hisao Seki
Shiro Terasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15748978A priority Critical patent/JPS5585022A/en
Publication of JPS5585022A publication Critical patent/JPS5585022A/en
Publication of JPS626645B2 publication Critical patent/JPS626645B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Furnace Charging Or Discharging (AREA)
  • Furnace Details (AREA)

Abstract

PURPOSE: To readily mount a plurality of furnace core tubes in a furnace for diffusing a semiconductor wafer by independently detachably attaching the tubes from the side surface in the longitudinal direction of the tubes to the furnace.
CONSTITUTION: A plurality of furnace core tubes 5 and a heater 19 are positioned by a guide 21 on a slender rotary plate 20, which is so carried on a base plate 22 as to move via rails 23, and moved on the rails 23 by rotating a handle 30 via combined gears 26, 27. Thus, since the furnace core tubes 5 can be independently moved to the side surface of a heat treating apparatus, the tubes can be simply replaced or cleaned so that dusts contaminating a semiconductor wafer may not be adhered thereto, and since only the tubes required for replacement are necessarily stopped, it can improve the workability of the apparatus.
COPYRIGHT: (C)1980,JPO&Japio
JP15748978A 1978-12-22 1978-12-22 Heat treating apparatus Granted JPS5585022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15748978A JPS5585022A (en) 1978-12-22 1978-12-22 Heat treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15748978A JPS5585022A (en) 1978-12-22 1978-12-22 Heat treating apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10458584A Division JPS6041217A (en) 1984-05-25 1984-05-25 Heat treating apparatus

Publications (2)

Publication Number Publication Date
JPS5585022A true JPS5585022A (en) 1980-06-26
JPS626645B2 JPS626645B2 (en) 1987-02-12

Family

ID=15650794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15748978A Granted JPS5585022A (en) 1978-12-22 1978-12-22 Heat treating apparatus

Country Status (1)

Country Link
JP (1) JPS5585022A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132441U (en) * 1981-02-12 1982-08-18
JPS6041217A (en) * 1984-05-25 1985-03-04 Hitachi Ltd Heat treating apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63213720A (en) * 1987-03-02 1988-09-06 Noritsu Co Ltd Safety device for hot-water supplier
US20230351723A1 (en) 2020-10-23 2023-11-02 Nec Corporation Individual identification apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04289U (en) * 1990-04-17 1992-01-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04289U (en) * 1990-04-17 1992-01-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132441U (en) * 1981-02-12 1982-08-18
JPS6041217A (en) * 1984-05-25 1985-03-04 Hitachi Ltd Heat treating apparatus

Also Published As

Publication number Publication date
JPS626645B2 (en) 1987-02-12

Similar Documents

Publication Publication Date Title
GB2114813B (en) Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet
DE3065445D1 (en) Arrangement for abducting heat from large-scale integrated semiconductor circuits
GB8311831D0 (en) Apparatus for heat treating semiconductor wafer
JPS52135453A (en) Wafer dryer
JPS5277590A (en) Semiconductor producing device
JPS5585022A (en) Heat treating apparatus
JPS5434751A (en) Washing method for silicon wafer
FR2313136A1 (en) METHOD FOR SUPPLYING HEAT IN THE SOLVENT BATH OF A DEGREASING APPARATUS
JPS5319104A (en) Observing apparatus for inside of high temperature vessel
JPS57181519A (en) Heat treatment apparatus for work
BG31506A3 (en) Apparatus for diskovering the lapses in cooling system for nozzles of blast furnaces
JPS5419673A (en) Object trasfer device
JPS53136484A (en) Wafer continuous machining method and unit used for the same
JPS5694642A (en) Processing device of wafer
ZA824548B (en) Process for the cleaning of gas-flow heat exchangers
JPS53123081A (en) Semiconductor wafer heat treatment apparatus
JPS5416839A (en) Apparatus for treating sewage
JPS5585021A (en) Heat treating apparatus
JPS51149112A (en) A suport roller cooling apparatus in heat treatment furnaces
JPS522163A (en) Wafer cleaning and drying device
JPS5241469A (en) Tableware cleaning apparatus
JPS523798A (en) Multiple continuous stone material grinding apparatus
JPS524478A (en) Foreign matter discharging apparatus
JPS5271876A (en) Apparatus for washing test tubes
JPS53105367A (en) Jig for heat treatment of wafer