JPS53123081A - Semiconductor wafer heat treatment apparatus - Google Patents
Semiconductor wafer heat treatment apparatusInfo
- Publication number
- JPS53123081A JPS53123081A JP3774377A JP3774377A JPS53123081A JP S53123081 A JPS53123081 A JP S53123081A JP 3774377 A JP3774377 A JP 3774377A JP 3774377 A JP3774377 A JP 3774377A JP S53123081 A JPS53123081 A JP S53123081A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- treatment apparatus
- semiconductor wafer
- wafer heat
- prevent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevent the entry of the outside air into a furnace core tube and prevent the warpage of wafers by providing a hollow plate for gas blow-out near the portion connecting a gas inlet port and a boat of a draw-out bar which is used for putting semiconductor wafers into or out from a heat treatment apparatus and further providing one or more shield plates in adjacency thereto.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3774377A JPS53123081A (en) | 1977-04-01 | 1977-04-01 | Semiconductor wafer heat treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3774377A JPS53123081A (en) | 1977-04-01 | 1977-04-01 | Semiconductor wafer heat treatment apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53123081A true JPS53123081A (en) | 1978-10-27 |
Family
ID=12505952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3774377A Pending JPS53123081A (en) | 1977-04-01 | 1977-04-01 | Semiconductor wafer heat treatment apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53123081A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5636129A (en) * | 1979-08-31 | 1981-04-09 | Hitachi Ltd | Method and device for heat treatment of semiconductor thin plate |
JPS62293610A (en) * | 1986-06-12 | 1987-12-21 | Furukawa Electric Co Ltd:The | Semiconductor thin film vapor growth equipment |
-
1977
- 1977-04-01 JP JP3774377A patent/JPS53123081A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5636129A (en) * | 1979-08-31 | 1981-04-09 | Hitachi Ltd | Method and device for heat treatment of semiconductor thin plate |
JPS634343B2 (en) * | 1979-08-31 | 1988-01-28 | Hitachi Ltd | |
JPS62293610A (en) * | 1986-06-12 | 1987-12-21 | Furukawa Electric Co Ltd:The | Semiconductor thin film vapor growth equipment |
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