JPS522163A - Wafer cleaning and drying device - Google Patents

Wafer cleaning and drying device

Info

Publication number
JPS522163A
JPS522163A JP7657275A JP7657275A JPS522163A JP S522163 A JPS522163 A JP S522163A JP 7657275 A JP7657275 A JP 7657275A JP 7657275 A JP7657275 A JP 7657275A JP S522163 A JPS522163 A JP S522163A
Authority
JP
Japan
Prior art keywords
drying device
wafer cleaning
wafer
cleaning
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7657275A
Other languages
Japanese (ja)
Other versions
JPS5324299B2 (en
Inventor
Hisao Seki
Hiroto Nagatomo
Ryoichi Okuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7657275A priority Critical patent/JPS522163A/en
Publication of JPS522163A publication Critical patent/JPS522163A/en
Publication of JPS5324299B2 publication Critical patent/JPS5324299B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To improve yield of fabrication of semiconductor by reducing improper rate of continuous heating treatment by preventing contamination of wafer by cleaning and drying the wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP7657275A 1975-06-24 1975-06-24 Wafer cleaning and drying device Granted JPS522163A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7657275A JPS522163A (en) 1975-06-24 1975-06-24 Wafer cleaning and drying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7657275A JPS522163A (en) 1975-06-24 1975-06-24 Wafer cleaning and drying device

Publications (2)

Publication Number Publication Date
JPS522163A true JPS522163A (en) 1977-01-08
JPS5324299B2 JPS5324299B2 (en) 1978-07-20

Family

ID=13608941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7657275A Granted JPS522163A (en) 1975-06-24 1975-06-24 Wafer cleaning and drying device

Country Status (1)

Country Link
JP (1) JPS522163A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02103805U (en) * 1989-02-03 1990-08-17
US5069236A (en) * 1990-03-07 1991-12-03 Pathway Systems, Inc. Method and apparatus for cleaning disks
US5107880A (en) * 1990-03-07 1992-04-28 Pathway Systems, Inc. Disk cleaning apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02103805U (en) * 1989-02-03 1990-08-17
US5069236A (en) * 1990-03-07 1991-12-03 Pathway Systems, Inc. Method and apparatus for cleaning disks
US5107880A (en) * 1990-03-07 1992-04-28 Pathway Systems, Inc. Disk cleaning apparatus

Also Published As

Publication number Publication date
JPS5324299B2 (en) 1978-07-20

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