JPS5538058A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5538058A
JPS5538058A JP11154178A JP11154178A JPS5538058A JP S5538058 A JPS5538058 A JP S5538058A JP 11154178 A JP11154178 A JP 11154178A JP 11154178 A JP11154178 A JP 11154178A JP S5538058 A JPS5538058 A JP S5538058A
Authority
JP
Japan
Prior art keywords
recombination
generation
center
depletion layer
layer region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11154178A
Other languages
Japanese (ja)
Inventor
Yasutami Tsukurida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11154178A priority Critical patent/JPS5538058A/en
Publication of JPS5538058A publication Critical patent/JPS5538058A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To shorten inverse recovery time without increasing leakage currents in the reverse direction, by selectively distributing the center of the recombination of the generation of carriers only at the outside of a depletion layer region.
CONSTITUTION: The center of the recombination of the generation of carriers is distributed at the outside of a depletion layer region of a layer n of P+n junction in concentration higher than its existence in the depletion layer region. the irradiation of electron rays, the irradiation of protons and the shooting of Au ions and Pt ions, for example, are used for obtaining the distribution of the concentration of the center of the recombination of the generation. Au, etc. are thermally diffused at temperature lower than conventional devices. Since the concentration of the center of the recombination of generation at the outside of the depletion layer region of the layer n decides inverse recovery time in a P+n diode, and the center of the recombination of generation in the depletion layer region increases leakage currents, the characteristics of switching can be improved if the center of the recombination of generation is distributed only at the outside of the depletion layer region.
COPYRIGHT: (C)1980,JPO&Japio
JP11154178A 1978-09-11 1978-09-11 Semiconductor device Pending JPS5538058A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11154178A JPS5538058A (en) 1978-09-11 1978-09-11 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11154178A JPS5538058A (en) 1978-09-11 1978-09-11 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5538058A true JPS5538058A (en) 1980-03-17

Family

ID=14563973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11154178A Pending JPS5538058A (en) 1978-09-11 1978-09-11 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5538058A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151766A (en) * 1989-05-18 1992-09-29 Asea Brown Boveri Ltd. Semiconductor component
JPH0629558A (en) * 1992-07-08 1994-02-04 Naoshige Tamamushi Electrostatic induction diode having planar structure
JPH07106605A (en) * 1993-10-05 1995-04-21 Toyo Electric Mfg Co Ltd High speed diode
EP0977271A2 (en) * 1998-07-28 2000-02-02 Hitachi, Ltd. Semiconductor IGBT module
JP2007242765A (en) * 2006-03-07 2007-09-20 Toyota Motor Corp Diode, manufacturing method, and method for controlling inverse recovery current
JPWO2016157935A1 (en) * 2015-04-02 2017-04-27 三菱電機株式会社 Method for manufacturing power semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151766A (en) * 1989-05-18 1992-09-29 Asea Brown Boveri Ltd. Semiconductor component
JPH0629558A (en) * 1992-07-08 1994-02-04 Naoshige Tamamushi Electrostatic induction diode having planar structure
JPH07106605A (en) * 1993-10-05 1995-04-21 Toyo Electric Mfg Co Ltd High speed diode
EP0977271A2 (en) * 1998-07-28 2000-02-02 Hitachi, Ltd. Semiconductor IGBT module
EP0977271A3 (en) * 1998-07-28 2001-02-28 Hitachi, Ltd. Semiconductor IGBT module
JP2007242765A (en) * 2006-03-07 2007-09-20 Toyota Motor Corp Diode, manufacturing method, and method for controlling inverse recovery current
JPWO2016157935A1 (en) * 2015-04-02 2017-04-27 三菱電機株式会社 Method for manufacturing power semiconductor device

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