JPS5516444A - Producing method of semiconductor thin film resistance - Google Patents
Producing method of semiconductor thin film resistanceInfo
- Publication number
- JPS5516444A JPS5516444A JP8944778A JP8944778A JPS5516444A JP S5516444 A JPS5516444 A JP S5516444A JP 8944778 A JP8944778 A JP 8944778A JP 8944778 A JP8944778 A JP 8944778A JP S5516444 A JPS5516444 A JP S5516444A
- Authority
- JP
- Japan
- Prior art keywords
- film
- resistance
- semiconductor thin
- thin film
- protection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE: To obtain product with stable resistance value by performing anneal treatment after the formation of protection film covering a semiconductor thin film resistance.
CONSTITUTION: Anneal treatment is performed after the formation of a protection film 8 covering a semiconductor thin film resistance 3. For example, during the production process of MOSLSI, a polycrystalline Si film resistance 3 is formed, by CVD method, on a field oxidated film 2 formed on an Si base plate 1 by thermal oxidation method, to form a pair of contact-diffusion areas 4a, 4b by placing a mask of SiO2 film 5. Next, a layer insulation film 6 made of phosphorus glass, etc., and an Al wiring layer 7 are formed; and, after a protection film 8, made of phosphorus glass by CVD method or silicon nitride, etc., by plasma vapor phase reaction method, is formed, heat treatment is done under a certain condition such as in hydrogen atmosphere, 400°C, for 120 minutes, etc. Under above processes, the selection of kinds of protection films and heat treatment conditions produces a thin layer resistance with stable and desired resistance value.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8944778A JPS5516444A (en) | 1978-07-24 | 1978-07-24 | Producing method of semiconductor thin film resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8944778A JPS5516444A (en) | 1978-07-24 | 1978-07-24 | Producing method of semiconductor thin film resistance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5516444A true JPS5516444A (en) | 1980-02-05 |
Family
ID=13970927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8944778A Pending JPS5516444A (en) | 1978-07-24 | 1978-07-24 | Producing method of semiconductor thin film resistance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5516444A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116160A (en) * | 1983-11-29 | 1985-06-22 | Sony Corp | Manufacture of semiconductor device |
| US10065308B2 (en) | 2014-12-19 | 2018-09-04 | Kurion, Inc. | Systems and methods for chain joint cable routing |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50134782A (en) * | 1974-04-15 | 1975-10-25 | ||
| JPS5240082A (en) * | 1975-09-25 | 1977-03-28 | Nec Corp | Resistor element and process for production of same |
-
1978
- 1978-07-24 JP JP8944778A patent/JPS5516444A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50134782A (en) * | 1974-04-15 | 1975-10-25 | ||
| JPS5240082A (en) * | 1975-09-25 | 1977-03-28 | Nec Corp | Resistor element and process for production of same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116160A (en) * | 1983-11-29 | 1985-06-22 | Sony Corp | Manufacture of semiconductor device |
| US10065308B2 (en) | 2014-12-19 | 2018-09-04 | Kurion, Inc. | Systems and methods for chain joint cable routing |
| US11969888B2 (en) | 2014-12-19 | 2024-04-30 | Veolia Nuclear Solutions, Inc. | Systems and methods for chain joint cable routing |
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