JPS55144229A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS55144229A
JPS55144229A JP5279379A JP5279379A JPS55144229A JP S55144229 A JPS55144229 A JP S55144229A JP 5279379 A JP5279379 A JP 5279379A JP 5279379 A JP5279379 A JP 5279379A JP S55144229 A JPS55144229 A JP S55144229A
Authority
JP
Japan
Prior art keywords
substrate
expansion member
support base
exposure mask
pressure gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5279379A
Other languages
Japanese (ja)
Inventor
Akira Otsuka
Yasunari Shirouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5279379A priority Critical patent/JPS55144229A/en
Publication of JPS55144229A publication Critical patent/JPS55144229A/en
Pending legal-status Critical Current

Links

Landscapes

  • Holders For Sensitive Materials And Originals (AREA)

Abstract

PURPOSE: To enable the even contact of a substrate and exposure mask to be readily obtained by feeding high-pressure gas between the soft expansion member on which the substrate is placed and a support base and letting the expansion member elongate.
CONSTITUTION: A substrate 3 is placed on a support base 1 which is provided with a high-pressure gas feed hole 11 and is freely adjustable within the horizontal and vertical planes, by way of a soft expansion member 2. In this state, an exposure mask 4 which has been formed with the specified electrode patterns in opposition to the substrate 3 is disposed in proximity in the form of being affixed to a mask holding plate 5 and is finely aligned of positions by making fine adjustment of the support base 1. If compressed air is fed between the support base 1 and soft expansion member 2 through the high-pressure gas feed hole 11 of the support table 1, the expansion member 2 is pushed upward, by which the substrate 3 placed thereon is evenly pressure-contacted to the exposure mask 4. In this way, the even contact of the substrate 3 and exposure mask 4 is readily obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP5279379A 1979-04-27 1979-04-27 Exposure device Pending JPS55144229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5279379A JPS55144229A (en) 1979-04-27 1979-04-27 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5279379A JPS55144229A (en) 1979-04-27 1979-04-27 Exposure device

Publications (1)

Publication Number Publication Date
JPS55144229A true JPS55144229A (en) 1980-11-11

Family

ID=12924707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5279379A Pending JPS55144229A (en) 1979-04-27 1979-04-27 Exposure device

Country Status (1)

Country Link
JP (1) JPS55144229A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0420526A2 (en) * 1989-09-28 1991-04-03 AT&T Corp. Improved contact printing process
EP0953878A2 (en) * 1998-04-28 1999-11-03 Ushiodenki Kabushiki Kaisha Contact exposure process and device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0420526A2 (en) * 1989-09-28 1991-04-03 AT&T Corp. Improved contact printing process
EP0953878A2 (en) * 1998-04-28 1999-11-03 Ushiodenki Kabushiki Kaisha Contact exposure process and device
EP0953878A3 (en) * 1998-04-28 2002-06-12 Ushiodenki Kabushiki Kaisha Contact exposure process and device

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