JPS547277A - Fine adjustment unit for stage - Google Patents

Fine adjustment unit for stage

Info

Publication number
JPS547277A
JPS547277A JP7314477A JP7314477A JPS547277A JP S547277 A JPS547277 A JP S547277A JP 7314477 A JP7314477 A JP 7314477A JP 7314477 A JP7314477 A JP 7314477A JP S547277 A JPS547277 A JP S547277A
Authority
JP
Japan
Prior art keywords
stage
fine adjustment
adjustment unit
spring
spring constant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7314477A
Other languages
Japanese (ja)
Inventor
Toshiyuki Horiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7314477A priority Critical patent/JPS547277A/en
Publication of JPS547277A publication Critical patent/JPS547277A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Abstract

PURPOSE: To make it possible to position a stage with high precision through fine adjustment, by supporting the stage perpendicularly to the moving direction of the stage with a plate spring large in spring constant and by moving the state with a driving spring small in spring constant.
COPYRIGHT: (C)1979,JPO&Japio
JP7314477A 1977-06-20 1977-06-20 Fine adjustment unit for stage Pending JPS547277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7314477A JPS547277A (en) 1977-06-20 1977-06-20 Fine adjustment unit for stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7314477A JPS547277A (en) 1977-06-20 1977-06-20 Fine adjustment unit for stage

Publications (1)

Publication Number Publication Date
JPS547277A true JPS547277A (en) 1979-01-19

Family

ID=13509702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7314477A Pending JPS547277A (en) 1977-06-20 1977-06-20 Fine adjustment unit for stage

Country Status (1)

Country Link
JP (1) JPS547277A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173339U (en) * 1983-05-04 1984-11-19 東芝機械株式会社 Support device for rotating stage for semiconductor device manufacturing
US4778143A (en) * 1984-06-15 1988-10-18 Omron Tateisi Electronics Co. Apparatus for locking movable table
CN102840820A (en) * 2012-08-29 2012-12-26 西安理工大学 Fine adjustment device for capacitive sensor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4710870U (en) * 1971-03-05 1972-10-09
JPS4911074A (en) * 1972-05-26 1974-01-31

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4710870U (en) * 1971-03-05 1972-10-09
JPS4911074A (en) * 1972-05-26 1974-01-31

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173339U (en) * 1983-05-04 1984-11-19 東芝機械株式会社 Support device for rotating stage for semiconductor device manufacturing
US4778143A (en) * 1984-06-15 1988-10-18 Omron Tateisi Electronics Co. Apparatus for locking movable table
CN102840820A (en) * 2012-08-29 2012-12-26 西安理工大学 Fine adjustment device for capacitive sensor

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