JPS55130817A - Producing boron structural material - Google Patents
Producing boron structural materialInfo
- Publication number
- JPS55130817A JPS55130817A JP3816779A JP3816779A JPS55130817A JP S55130817 A JPS55130817 A JP S55130817A JP 3816779 A JP3816779 A JP 3816779A JP 3816779 A JP3816779 A JP 3816779A JP S55130817 A JPS55130817 A JP S55130817A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- boron
- layer
- structural material
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Abstract
PURPOSE:To provide boron structural material excellent in mechanical properties with high productivity by a method wherein an aluminum-contg. chromium layer is provided on the base metal to form a substrate, a boron layer is formed on the substrate, and the substrate is selectively removed. CONSTITUTION:On a base metal such as tantalum and titanium, chromium which contains 1-35mol% of aluminum is deposited to form a 0.3-2mu layer, by means of electroplating or vacuum deposition, to form a substrate. The substrate is heated to about 900 deg.C or more and brought into contact with a mixed gas of BCl3 and H2 (about 1:3 volume ratio) so that boron is chemically deposited on the substrate to form a boron layer with a desired thickness. This is immersed into a solvent (e.g. a methanol solution of bromine, chlorine etc.) to selectively dissolve the substrate and remove it, leaving a structural material mainly consisting of single boron element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3816779A JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3816779A JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55130817A true JPS55130817A (en) | 1980-10-11 |
JPS6141846B2 JPS6141846B2 (en) | 1986-09-18 |
Family
ID=12517834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3816779A Granted JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55130817A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1595976A1 (en) * | 2003-02-19 | 2005-11-16 | Ulvac, Inc. | Film-forming apparatus component and method for cleaning same |
CN111212814A (en) * | 2017-10-17 | 2020-05-29 | 株式会社德山 | Boron structure and boron powder |
-
1979
- 1979-03-29 JP JP3816779A patent/JPS55130817A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1595976A1 (en) * | 2003-02-19 | 2005-11-16 | Ulvac, Inc. | Film-forming apparatus component and method for cleaning same |
EP1595976A4 (en) * | 2003-02-19 | 2011-05-04 | Ulvac Inc | Film-forming apparatus component and method for cleaning same |
US8216654B2 (en) | 2003-02-19 | 2012-07-10 | Ulvac, Inc. | Components for a film-forming device and method for cleaning the same |
CN111212814A (en) * | 2017-10-17 | 2020-05-29 | 株式会社德山 | Boron structure and boron powder |
Also Published As
Publication number | Publication date |
---|---|
JPS6141846B2 (en) | 1986-09-18 |
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