JPS5512732A - Sputtering apparatus for making thin magnetic film - Google Patents

Sputtering apparatus for making thin magnetic film

Info

Publication number
JPS5512732A
JPS5512732A JP8522978A JP8522978A JPS5512732A JP S5512732 A JPS5512732 A JP S5512732A JP 8522978 A JP8522978 A JP 8522978A JP 8522978 A JP8522978 A JP 8522978A JP S5512732 A JPS5512732 A JP S5512732A
Authority
JP
Japan
Prior art keywords
target
chrome
making
cobalt
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8522978A
Other languages
Japanese (ja)
Other versions
JPS6151410B2 (en
Inventor
Hidefumi Funaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP8522978A priority Critical patent/JPS5512732A/en
Publication of JPS5512732A publication Critical patent/JPS5512732A/en
Publication of JPS6151410B2 publication Critical patent/JPS6151410B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To increase the speed of making a thin film by employing magnetic material for constructing a target so as to make it produce a sufficient magnetic field when using such a sputtering method that the magnetic field generated intersects the electric field added between the target and subtrate holder.
CONSTITUTION: The target consists of the first target member 46 in the form of a plate, or an alloy of cobalt and chrome with the chrome content of 30% or more and without strong ferromagnetic properties; and the second target members 47, 48 and 49 made of an alloy of cobalt and chrome with the chrome content of 20%-0%, and with the saturated magnetization of 200 gauss or more. The second target members 47, 48, and 49 are arranged on the plane opposite to the one where permanent magnets 44 and 45 for the first target member 46 are arranged on it, then lines of magnetic force 105 and 106 which have components intersecting the electric fields at right angles are generated by making each of the second target members 47, 48 and 49 the auxiliary magnetic poles of the permanent magnets 44 and 45.
COPYRIGHT: (C)1980,JPO&Japio
JP8522978A 1978-07-14 1978-07-14 Sputtering apparatus for making thin magnetic film Granted JPS5512732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8522978A JPS5512732A (en) 1978-07-14 1978-07-14 Sputtering apparatus for making thin magnetic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8522978A JPS5512732A (en) 1978-07-14 1978-07-14 Sputtering apparatus for making thin magnetic film

Publications (2)

Publication Number Publication Date
JPS5512732A true JPS5512732A (en) 1980-01-29
JPS6151410B2 JPS6151410B2 (en) 1986-11-08

Family

ID=13852729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8522978A Granted JPS5512732A (en) 1978-07-14 1978-07-14 Sputtering apparatus for making thin magnetic film

Country Status (1)

Country Link
JP (1) JPS5512732A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5734324A (en) * 1980-08-08 1982-02-24 Teijin Ltd Manufacture of vertically magnetized film
JPS57157511A (en) * 1981-03-24 1982-09-29 Teijin Ltd Opposite target type sputtering device
JPS59190364A (en) * 1984-03-23 1984-10-29 Hitachi Ltd Sputtering device
JPS60182712A (en) * 1984-02-29 1985-09-18 Anelva Corp Ferromagnetic-material target
US4626336A (en) * 1985-05-02 1986-12-02 Hewlett Packard Company Target for sputter depositing thin films
US4834855A (en) * 1985-05-02 1989-05-30 Hewlett-Packard Company Method for sputter depositing thin films
US5458759A (en) * 1991-08-02 1995-10-17 Anelva Corporation Magnetron sputtering cathode apparatus
US5464518A (en) * 1993-01-15 1995-11-07 The Boc Group, Inc. Cylindrical magnetron shield structure
US5470452A (en) * 1990-08-10 1995-11-28 Viratec Thin Films, Inc. Shielding for arc suppression in rotating magnetron sputtering systems
US5527439A (en) * 1995-01-23 1996-06-18 The Boc Group, Inc. Cylindrical magnetron shield structure

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5734324A (en) * 1980-08-08 1982-02-24 Teijin Ltd Manufacture of vertically magnetized film
JPS6367328B2 (en) * 1980-08-08 1988-12-26 Teijin Ltd
JPS57157511A (en) * 1981-03-24 1982-09-29 Teijin Ltd Opposite target type sputtering device
JPH031810B2 (en) * 1981-03-24 1991-01-11 Teijin Kk
JPS60182712A (en) * 1984-02-29 1985-09-18 Anelva Corp Ferromagnetic-material target
JPS59190364A (en) * 1984-03-23 1984-10-29 Hitachi Ltd Sputtering device
US4834855A (en) * 1985-05-02 1989-05-30 Hewlett-Packard Company Method for sputter depositing thin films
US4626336A (en) * 1985-05-02 1986-12-02 Hewlett Packard Company Target for sputter depositing thin films
US5470452A (en) * 1990-08-10 1995-11-28 Viratec Thin Films, Inc. Shielding for arc suppression in rotating magnetron sputtering systems
US5725746A (en) * 1990-08-10 1998-03-10 Viratec Thin Films, Inc. Shielding for arc suppression in rotating magnetron sputtering systems
US5458759A (en) * 1991-08-02 1995-10-17 Anelva Corporation Magnetron sputtering cathode apparatus
US5464518A (en) * 1993-01-15 1995-11-07 The Boc Group, Inc. Cylindrical magnetron shield structure
US5527439A (en) * 1995-01-23 1996-06-18 The Boc Group, Inc. Cylindrical magnetron shield structure

Also Published As

Publication number Publication date
JPS6151410B2 (en) 1986-11-08

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