JPS55111130A - Electron beam scanning system - Google Patents

Electron beam scanning system

Info

Publication number
JPS55111130A
JPS55111130A JP1834079A JP1834079A JPS55111130A JP S55111130 A JPS55111130 A JP S55111130A JP 1834079 A JP1834079 A JP 1834079A JP 1834079 A JP1834079 A JP 1834079A JP S55111130 A JPS55111130 A JP S55111130A
Authority
JP
Japan
Prior art keywords
electron beam
electron
shifted
pattern
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1834079A
Other languages
Japanese (ja)
Other versions
JPS5745058B2 (en
Inventor
Katsuhiro Kuroda
Akihira Fujinami
Akinori Shibayama
Tsuneo Okubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP1834079A priority Critical patent/JPS55111130A/en
Publication of JPS55111130A publication Critical patent/JPS55111130A/en
Publication of JPS5745058B2 publication Critical patent/JPS5745058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a high speed electron scanning, by a method, when a square aperture is reduced in shape and projected on an electron sensitive material to display a pattern, wherein a digital scanning and an analog scanning are performed jointly. CONSTITUTION:When a pattern shown in the figure is to be displayed and the electron beam is stopped at a position 11, the electron beam radiation is continued for a predetermined time t1, then the electron beam is shifted and stopped at a position 12 in a time t2 and the radiation is continued for the time t1, and is shifted again to a position 13 after the time t2. In this way the beam is digitally scanned one after another along the circumference of the pattern till the beam reaches a position 14. Then the beam is shifted to a position 15 and scanned till it reaches a position 16 radiating the electron beam to the electron sensitive material. From this position, the beam is shifted without radiating the electron beam to a position 17. From the position 17, the beam is scanned radiating the electron beam similarly till the beam reaches to a position 18, and displays the inside of the pattern by the analog scanning.
JP1834079A 1979-02-21 1979-02-21 Electron beam scanning system Granted JPS55111130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1834079A JPS55111130A (en) 1979-02-21 1979-02-21 Electron beam scanning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1834079A JPS55111130A (en) 1979-02-21 1979-02-21 Electron beam scanning system

Publications (2)

Publication Number Publication Date
JPS55111130A true JPS55111130A (en) 1980-08-27
JPS5745058B2 JPS5745058B2 (en) 1982-09-25

Family

ID=11968913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1834079A Granted JPS55111130A (en) 1979-02-21 1979-02-21 Electron beam scanning system

Country Status (1)

Country Link
JP (1) JPS55111130A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0153864A2 (en) * 1984-02-29 1985-09-04 Fujitsu Limited A method of electron beam exposure
JPS6114720A (en) * 1984-06-29 1986-01-22 Fujitsu Ltd Electron beam exposure method
US20190270159A1 (en) * 2012-01-16 2019-09-05 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119179A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119179A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0153864A2 (en) * 1984-02-29 1985-09-04 Fujitsu Limited A method of electron beam exposure
JPS6114720A (en) * 1984-06-29 1986-01-22 Fujitsu Ltd Electron beam exposure method
JPH0220133B2 (en) * 1984-06-29 1990-05-08 Fujitsu Ltd
US20190270159A1 (en) * 2012-01-16 2019-09-05 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam
US11504798B2 (en) * 2012-01-16 2022-11-22 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam

Also Published As

Publication number Publication date
JPS5745058B2 (en) 1982-09-25

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