JPS5494882A - X-ray exposure apparatus - Google Patents
X-ray exposure apparatusInfo
- Publication number
- JPS5494882A JPS5494882A JP151378A JP151378A JPS5494882A JP S5494882 A JPS5494882 A JP S5494882A JP 151378 A JP151378 A JP 151378A JP 151378 A JP151378 A JP 151378A JP S5494882 A JPS5494882 A JP S5494882A
- Authority
- JP
- Japan
- Prior art keywords
- alignment controller
- wafers
- mask
- stage
- high accuracy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To enable high accuracy and processing ability to be obtained by simultaneously exposing plural sheets of wafers with one set of X-ray light source, mark detector and alignment controller.
CONSTITUTION: A turntable 31 rotates about its shaft 32 and its X.Y.θ stages 33 which have masks are disposed 4 or more on the concentrical circle, facing an X- ray source 35 positioned on the extension line of the center shaft 32 of the table 31. An alignment controller 37, fixed to the outside of the table 31, opposes to one set of the stage 33 and mask 34. The table 31 is rotated at a specified angle in the direction of the arrow 41 to a position 42 so that the mask 34 is opposed to the mark detecting position 36 and the stage 33 to the alignment controller. These enable plural sheets of wafers to be exposed simultaneously and high accuracy and processing ability to be obtained.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53001513A JPS5950216B2 (en) | 1978-01-12 | 1978-01-12 | X-ray exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53001513A JPS5950216B2 (en) | 1978-01-12 | 1978-01-12 | X-ray exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5494882A true JPS5494882A (en) | 1979-07-26 |
JPS5950216B2 JPS5950216B2 (en) | 1984-12-07 |
Family
ID=11503554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53001513A Expired JPS5950216B2 (en) | 1978-01-12 | 1978-01-12 | X-ray exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5950216B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767927A (en) * | 1980-10-15 | 1982-04-24 | Nec Corp | X-ray exposure device |
JPS5940533A (en) * | 1982-08-30 | 1984-03-06 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | X-ray lithographic method and system for executing same method |
JPH07209876A (en) * | 1995-01-30 | 1995-08-11 | Canon Inc | X-ray transfer device and method |
-
1978
- 1978-01-12 JP JP53001513A patent/JPS5950216B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767927A (en) * | 1980-10-15 | 1982-04-24 | Nec Corp | X-ray exposure device |
JPS5940533A (en) * | 1982-08-30 | 1984-03-06 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | X-ray lithographic method and system for executing same method |
JPH07209876A (en) * | 1995-01-30 | 1995-08-11 | Canon Inc | X-ray transfer device and method |
Also Published As
Publication number | Publication date |
---|---|
JPS5950216B2 (en) | 1984-12-07 |
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