JPS551107A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS551107A
JPS551107A JP7221278A JP7221278A JPS551107A JP S551107 A JPS551107 A JP S551107A JP 7221278 A JP7221278 A JP 7221278A JP 7221278 A JP7221278 A JP 7221278A JP S551107 A JPS551107 A JP S551107A
Authority
JP
Japan
Prior art keywords
mask
radiation source
optical systems
away
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7221278A
Other languages
Japanese (ja)
Inventor
Satoru Nakayama
Kiyoshi Higuchi
Yasunao Saito
Nobuya Shinoyama
Hisao Izawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Telegraph and Telephone Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Telegraph and Telephone Corp, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP7221278A priority Critical patent/JPS551107A/en
Publication of JPS551107A publication Critical patent/JPS551107A/en
Pending legal-status Critical Current

Links

Landscapes

  • Radiography Using Non-Light Waves (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To place a positioning unit under the atmosphere and effect exposure thereunder, by positioning optical systems over a mask and placing a radiation source away from the mask in the adjustment of their positions and by placing the radiation source near over the mask and placing the optical systems away from the mask in the exposure.
CONSTITUTION: Before radiation is applied from a radiation source chamber 8 to a copied piece through the mask 6 to copy an image, the radiation source is placed away from the mask 6 by a radiation source mechanism 17 and the positioning between the copied piece and the mask 6 is confirmed by the optical systems 21, 22. The optical systems are positioned over the mask 6 while the radiation source remains away from the mask 6. To perform the exposure, the radiation source is placed near over the mask 6 while the optical systems 21, 22 remain away from the mask. Therefore, the positioning unit can be placed under the atmosphere to effect the exposure thereunder.
COPYRIGHT: (C)1980,JPO&Japio
JP7221278A 1978-06-16 1978-06-16 Exposure device Pending JPS551107A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7221278A JPS551107A (en) 1978-06-16 1978-06-16 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7221278A JPS551107A (en) 1978-06-16 1978-06-16 Exposure device

Publications (1)

Publication Number Publication Date
JPS551107A true JPS551107A (en) 1980-01-07

Family

ID=13482700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7221278A Pending JPS551107A (en) 1978-06-16 1978-06-16 Exposure device

Country Status (1)

Country Link
JP (1) JPS551107A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188123A (en) * 1983-04-08 1984-10-25 Nec Corp X-ray exposure device
JPH0569402U (en) * 1992-02-27 1993-09-21 山武ハネウエル株式会社 Positioner
GB2276340A (en) * 1992-10-08 1994-09-28 Onoda Cement Co Ltd Method and apparatus for coating electrostatic powder

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50129044A (en) * 1974-03-29 1975-10-11
JPS5141551A (en) * 1974-08-08 1976-04-07 Laitram Corp
JPS52113167A (en) * 1976-03-19 1977-09-22 Nippon Telegr & Teleph Corp <Ntt> X-ray exposing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50129044A (en) * 1974-03-29 1975-10-11
JPS5141551A (en) * 1974-08-08 1976-04-07 Laitram Corp
JPS52113167A (en) * 1976-03-19 1977-09-22 Nippon Telegr & Teleph Corp <Ntt> X-ray exposing device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188123A (en) * 1983-04-08 1984-10-25 Nec Corp X-ray exposure device
JPS6350853B2 (en) * 1983-04-08 1988-10-12 Nippon Denki Kk
JPH0569402U (en) * 1992-02-27 1993-09-21 山武ハネウエル株式会社 Positioner
GB2276340A (en) * 1992-10-08 1994-09-28 Onoda Cement Co Ltd Method and apparatus for coating electrostatic powder
GB2276340B (en) * 1992-10-08 1996-05-15 Onoda Cement Co Ltd Apparatus for electrostatic powder coating

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