JPS5232271A - Inspection method and equipment for photomask pattern - Google Patents

Inspection method and equipment for photomask pattern

Info

Publication number
JPS5232271A
JPS5232271A JP10797875A JP10797875A JPS5232271A JP S5232271 A JPS5232271 A JP S5232271A JP 10797875 A JP10797875 A JP 10797875A JP 10797875 A JP10797875 A JP 10797875A JP S5232271 A JPS5232271 A JP S5232271A
Authority
JP
Japan
Prior art keywords
equipment
inspection method
photomask pattern
wheter
photomasks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10797875A
Other languages
Japanese (ja)
Inventor
Mikio Hongo
Junichi Nakabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10797875A priority Critical patent/JPS5232271A/en
Publication of JPS5232271A publication Critical patent/JPS5232271A/en
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To inspect easily in short time wheter or not thin films transmitting visible light are formed on photomasks as required.
COPYRIGHT: (C)1977,JPO&Japio
JP10797875A 1975-09-08 1975-09-08 Inspection method and equipment for photomask pattern Pending JPS5232271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10797875A JPS5232271A (en) 1975-09-08 1975-09-08 Inspection method and equipment for photomask pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10797875A JPS5232271A (en) 1975-09-08 1975-09-08 Inspection method and equipment for photomask pattern

Publications (1)

Publication Number Publication Date
JPS5232271A true JPS5232271A (en) 1977-03-11

Family

ID=14472872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10797875A Pending JPS5232271A (en) 1975-09-08 1975-09-08 Inspection method and equipment for photomask pattern

Country Status (1)

Country Link
JP (1) JPS5232271A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118731U (en) * 1982-02-05 1983-08-13 株式会社日立製作所 LSI inspection equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118731U (en) * 1982-02-05 1983-08-13 株式会社日立製作所 LSI inspection equipment
JPS633156Y2 (en) * 1982-02-05 1988-01-26

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