JPS5491087A - Manufacture of thin-film solar cell - Google Patents
Manufacture of thin-film solar cellInfo
- Publication number
- JPS5491087A JPS5491087A JP15836177A JP15836177A JPS5491087A JP S5491087 A JPS5491087 A JP S5491087A JP 15836177 A JP15836177 A JP 15836177A JP 15836177 A JP15836177 A JP 15836177A JP S5491087 A JPS5491087 A JP S5491087A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- etching mask
- thin
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
Abstract
PURPOSE: To obtain a thin-film substrate which never causes a short circuit with its shape constant at the time of breaking a thin film away, by using a transparent insulating film, serving for a reflection preventive film, for an etching mask.
CONSTITUTION: On GaAl substrate 1, GaAlAs layer 2, GaAs layer 3 and GaAlAs layer 4 are epitaxy-grown in sequence. Next, upper electrode 5 which becomes ohmic is formed on it. Next, etching mask 8 of a transparent oxide such as SiO is masking-formed through vapor deposition, etc. Then, layers 4 and 3 are etched selectively in sequence. Etching mask 8' of the same transparent insulating film is also masking-formed. Layer 2 is etched and thin-film substrate 7' is peeled from substrate 1. Since etching mask 8 will not be etched by an etching solution, substrate 7' obtained in this way is constant in shape and the flank of the substrate insulated, so that no short will be caused at the flank. In addition, etching mask 8 serves for a reflection preventive film, so that the need for forming the reflection preventive film will be eliminated.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15836177A JPS5491087A (en) | 1977-12-28 | 1977-12-28 | Manufacture of thin-film solar cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15836177A JPS5491087A (en) | 1977-12-28 | 1977-12-28 | Manufacture of thin-film solar cell |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5491087A true JPS5491087A (en) | 1979-07-19 |
Family
ID=15669987
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15836177A Pending JPS5491087A (en) | 1977-12-28 | 1977-12-28 | Manufacture of thin-film solar cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5491087A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56142685A (en) * | 1980-04-09 | 1981-11-07 | Ricoh Co Ltd | Manufacture of photoelectric converter |
JPS62502089A (en) * | 1985-09-09 | 1987-08-13 | ヒュ−ズ・エアクラフト・カンパニ− | Thin semiconductor structure |
JPH042173A (en) * | 1990-04-19 | 1992-01-07 | Sanyo Electric Co Ltd | Manufacture of photovoltaic device |
JPH0491482A (en) * | 1990-08-01 | 1992-03-24 | Mitsubishi Electric Corp | Manufacture of solar cell |
JPH04312982A (en) * | 1991-01-28 | 1992-11-04 | Kobe Steel Ltd | Semiconductor polycrystalline diamond electronic device and manufacture thereof |
JPH05343712A (en) * | 1992-06-05 | 1993-12-24 | Hitachi Ltd | Manufacture of tandem heterogeneous photoelectric conversion element |
-
1977
- 1977-12-28 JP JP15836177A patent/JPS5491087A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56142685A (en) * | 1980-04-09 | 1981-11-07 | Ricoh Co Ltd | Manufacture of photoelectric converter |
JPS62502089A (en) * | 1985-09-09 | 1987-08-13 | ヒュ−ズ・エアクラフト・カンパニ− | Thin semiconductor structure |
JPH042173A (en) * | 1990-04-19 | 1992-01-07 | Sanyo Electric Co Ltd | Manufacture of photovoltaic device |
JPH0491482A (en) * | 1990-08-01 | 1992-03-24 | Mitsubishi Electric Corp | Manufacture of solar cell |
JPH04312982A (en) * | 1991-01-28 | 1992-11-04 | Kobe Steel Ltd | Semiconductor polycrystalline diamond electronic device and manufacture thereof |
JPH05343712A (en) * | 1992-06-05 | 1993-12-24 | Hitachi Ltd | Manufacture of tandem heterogeneous photoelectric conversion element |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5710992A (en) | Semiconductor device and manufacture therefor | |
JPS5491087A (en) | Manufacture of thin-film solar cell | |
JPS5471564A (en) | Production of semiconductor device | |
JPS5544713A (en) | Semiconductor device | |
JPS54161887A (en) | Schottky diode containing guard ring and its manufacture | |
JPS57145340A (en) | Manufacture of semiconductor device | |
JPS5559741A (en) | Preparation of semiconductor device | |
JPS55102235A (en) | Formation of interlayer conductive layer | |
JPS55138235A (en) | Manufacture of titanic etching solution and semiconductor device using this etching solution | |
JPS52119084A (en) | Manufacture of semiconductor integrated circuit | |
JPS5394767A (en) | Manufacture of semiconductor device | |
JPS5575259A (en) | Manufacturing method of semiconductor device | |
JPS5267963A (en) | Manufacture of semiconductor unit | |
JPS5793530A (en) | Semiconductor device | |
JPS5487471A (en) | Manufacture of semiconductor device | |
JPS5376752A (en) | Production of semionductor device | |
JPS5447577A (en) | Production of semiconductor device | |
JPS56165354A (en) | Semiconductor device | |
JPS54116894A (en) | Superconduction circuit device | |
JPS5790940A (en) | Manufacture of semiconductor device | |
JPS5282074A (en) | Production of sis structure | |
JPS52127176A (en) | Semiconductor device and its manufacture | |
JPS5456361A (en) | Semiconductor element | |
JPS57202758A (en) | Semiconductor device | |
JPS56148844A (en) | Manufacture of semiconductor device |