JPS5463682A - Production of mask for x-ray exposure - Google Patents
Production of mask for x-ray exposureInfo
- Publication number
- JPS5463682A JPS5463682A JP9946978A JP9946978A JPS5463682A JP S5463682 A JPS5463682 A JP S5463682A JP 9946978 A JP9946978 A JP 9946978A JP 9946978 A JP9946978 A JP 9946978A JP S5463682 A JPS5463682 A JP S5463682A
- Authority
- JP
- Japan
- Prior art keywords
- spacer
- layer
- mask
- plating
- adhere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make it easy to control the thickness of a spacer and obtain a good adhesion by causing a metallic layer to adhere to all the surface of a mask substrate and forming an optical absorption pattern and a spacer part by pattering and subjecting only the spacer part to plating.
CONSTITUTION: Au plating film 12 which becomes a ground metallic layer is caused to adhere onto mask substrate 11 such as Si and is subjected to patterning with a resistor mask to make only spacer part 13 remain and remove the needless part which becomes an optical absorption pattern. Next, the surface of remaining spacer part 13 is etched by an acid, and Au layer 14 is caused to adhere there for the purpose of obtaining a good adhesion to spacer materials such as Au and Ni which are plated after. After that, Au plating layer 15a or Ni plating layer 15b is formed on this layer 14, thereby making a spacer. As a result, the mask is enhanced in strength and becomes long-life because of reduced waste.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9946978A JPS5463682A (en) | 1978-08-17 | 1978-08-17 | Production of mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9946978A JPS5463682A (en) | 1978-08-17 | 1978-08-17 | Production of mask for x-ray exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5463682A true JPS5463682A (en) | 1979-05-22 |
Family
ID=14248162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9946978A Pending JPS5463682A (en) | 1978-08-17 | 1978-08-17 | Production of mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5463682A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06294898A (en) * | 1993-04-07 | 1994-10-21 | Rigaku Denki Kogyo Kk | Optical element and light condensing element for x-ray |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4882778A (en) * | 1972-01-14 | 1973-11-05 |
-
1978
- 1978-08-17 JP JP9946978A patent/JPS5463682A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4882778A (en) * | 1972-01-14 | 1973-11-05 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06294898A (en) * | 1993-04-07 | 1994-10-21 | Rigaku Denki Kogyo Kk | Optical element and light condensing element for x-ray |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8103615A1 (en) | Process for the production of photo-resist structures. | |
JPS5669835A (en) | Method for forming thin film pattern | |
JPS5463682A (en) | Production of mask for x-ray exposure | |
JPS5492061A (en) | Micropattern forming method | |
JPS5562732A (en) | Preparation of aperture stop | |
JPS5427367A (en) | Manufacture of microwave circuit pattern | |
JPS55100557A (en) | Electroforming method | |
JPS55138839A (en) | Method of fabricating semiconductor device | |
JPS5421272A (en) | Metal photo mask | |
JPS5429975A (en) | Photo mask | |
JPS5760839A (en) | Manufacture of x-ray exposure mask | |
JPS5588331A (en) | X-ray exposing mask | |
JPS52127174A (en) | Minute patern formation method | |
JPS5735860A (en) | Preparation of photomask | |
JPS53119228A (en) | Production of perforated plated metal foil | |
JPS53117973A (en) | Exposure method | |
JPS5635774A (en) | Dry etching method | |
JPS5381079A (en) | Mask forming method | |
JPS5561030A (en) | Preparation of mask | |
JPS5511341A (en) | Manufacturing method of magnetoelectric converter element | |
JPS5557229A (en) | Method for forming patterned conductor layer | |
JPS55105331A (en) | Method for forming electronic-beam resist pattern on electrical insulating material | |
JPS52109372A (en) | Forming of photo resist pattern | |
JPS553952A (en) | Method of manufacturing screen | |
JPS5586118A (en) | Alignment mark formation |