JPS5588331A - X-ray exposing mask - Google Patents
X-ray exposing maskInfo
- Publication number
- JPS5588331A JPS5588331A JP16245478A JP16245478A JPS5588331A JP S5588331 A JPS5588331 A JP S5588331A JP 16245478 A JP16245478 A JP 16245478A JP 16245478 A JP16245478 A JP 16245478A JP S5588331 A JPS5588331 A JP S5588331A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- silicon
- substrate
- film
- exposing mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain an X-ray exposing mask having improved mechanical strength by providing synthetic resin substrate containing a needle crystal or a fine wire of the material with small X-ray absorption coefficient.
CONSTITUTION: Polyimide prepolymer containing a silicon needle crystal is applied on the principal surface of a silicon substrate 1 to form a polyimide film 2 having 3W5μm thickness. Next, an X-ray absorption pattern 3 consisting of a metal is formed on the polyimide film 2 by a generally known method. Then, the silicon substrate 1 is subjected to a selective etching to form a silicon frame 4 left on the peripheral edge of the polymide film 2. The mechanical strength of the synthetic resin film substrate to support a mask pattern in thus improved, thereby an X-ray exposing mask capable of serving repeatedly is obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245478A JPS5588331A (en) | 1978-12-27 | 1978-12-27 | X-ray exposing mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245478A JPS5588331A (en) | 1978-12-27 | 1978-12-27 | X-ray exposing mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5588331A true JPS5588331A (en) | 1980-07-04 |
JPS617011B2 JPS617011B2 (en) | 1986-03-03 |
Family
ID=15754913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16245478A Granted JPS5588331A (en) | 1978-12-27 | 1978-12-27 | X-ray exposing mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5588331A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4606803A (en) * | 1983-11-02 | 1986-08-19 | U.S. Philips Corporation | Method of manufacturing a mask for the production of patterns in lacquer layers by means of X-ray lithography |
-
1978
- 1978-12-27 JP JP16245478A patent/JPS5588331A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4606803A (en) * | 1983-11-02 | 1986-08-19 | U.S. Philips Corporation | Method of manufacturing a mask for the production of patterns in lacquer layers by means of X-ray lithography |
Also Published As
Publication number | Publication date |
---|---|
JPS617011B2 (en) | 1986-03-03 |
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