JPS5416182A - X-ray exposure apparatus - Google Patents
X-ray exposure apparatusInfo
- Publication number
- JPS5416182A JPS5416182A JP8131777A JP8131777A JPS5416182A JP S5416182 A JPS5416182 A JP S5416182A JP 8131777 A JP8131777 A JP 8131777A JP 8131777 A JP8131777 A JP 8131777A JP S5416182 A JPS5416182 A JP S5416182A
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- ray exposure
- reaction
- inhibiting
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To achieve the improvement in pattern accuracy by isolating exposure chamber and radiation source chamber with an X-ray transmission window, filling reaction inhibiting gas, and stopping or inhibiting the reaction which continues even after the radiation of X-rays.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8131777A JPS5416182A (en) | 1977-07-06 | 1977-07-06 | X-ray exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8131777A JPS5416182A (en) | 1977-07-06 | 1977-07-06 | X-ray exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5416182A true JPS5416182A (en) | 1979-02-06 |
Family
ID=13743012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8131777A Pending JPS5416182A (en) | 1977-07-06 | 1977-07-06 | X-ray exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5416182A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005211652A (en) * | 2004-01-20 | 2005-08-11 | Ethicon Endo Surgery Inc | Medical device for providing access and medical treatment performing method |
-
1977
- 1977-07-06 JP JP8131777A patent/JPS5416182A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005211652A (en) * | 2004-01-20 | 2005-08-11 | Ethicon Endo Surgery Inc | Medical device for providing access and medical treatment performing method |
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