JPS5416182A - X-ray exposure apparatus - Google Patents

X-ray exposure apparatus

Info

Publication number
JPS5416182A
JPS5416182A JP8131777A JP8131777A JPS5416182A JP S5416182 A JPS5416182 A JP S5416182A JP 8131777 A JP8131777 A JP 8131777A JP 8131777 A JP8131777 A JP 8131777A JP S5416182 A JPS5416182 A JP S5416182A
Authority
JP
Japan
Prior art keywords
exposure apparatus
ray exposure
reaction
inhibiting
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8131777A
Other languages
Japanese (ja)
Inventor
Masaki Ito
Yoshitake Onishi
Kenji Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8131777A priority Critical patent/JPS5416182A/en
Publication of JPS5416182A publication Critical patent/JPS5416182A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To achieve the improvement in pattern accuracy by isolating exposure chamber and radiation source chamber with an X-ray transmission window, filling reaction inhibiting gas, and stopping or inhibiting the reaction which continues even after the radiation of X-rays.
COPYRIGHT: (C)1979,JPO&Japio
JP8131777A 1977-07-06 1977-07-06 X-ray exposure apparatus Pending JPS5416182A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8131777A JPS5416182A (en) 1977-07-06 1977-07-06 X-ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8131777A JPS5416182A (en) 1977-07-06 1977-07-06 X-ray exposure apparatus

Publications (1)

Publication Number Publication Date
JPS5416182A true JPS5416182A (en) 1979-02-06

Family

ID=13743012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8131777A Pending JPS5416182A (en) 1977-07-06 1977-07-06 X-ray exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5416182A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005211652A (en) * 2004-01-20 2005-08-11 Ethicon Endo Surgery Inc Medical device for providing access and medical treatment performing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005211652A (en) * 2004-01-20 2005-08-11 Ethicon Endo Surgery Inc Medical device for providing access and medical treatment performing method

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