JPS54156683A - Beam intensity distribution measuring apparatus in electron beam apparatus - Google Patents

Beam intensity distribution measuring apparatus in electron beam apparatus

Info

Publication number
JPS54156683A
JPS54156683A JP6511478A JP6511478A JPS54156683A JP S54156683 A JPS54156683 A JP S54156683A JP 6511478 A JP6511478 A JP 6511478A JP 6511478 A JP6511478 A JP 6511478A JP S54156683 A JPS54156683 A JP S54156683A
Authority
JP
Japan
Prior art keywords
detector
photo detecting
detecting surfaces
electron beam
intensity distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6511478A
Other languages
Japanese (ja)
Inventor
Korehito Matsuda
Nobuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6511478A priority Critical patent/JPS54156683A/en
Publication of JPS54156683A publication Critical patent/JPS54156683A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To directly obtain electron beam intensity distributions by using a detector which has stripe form or mesh form photo detecting surfaces.
CONSTITUTION: Stripe form or mesh form photo detecting surfaces are provided to a detector 13. Then, when a forming beam 11 is in the position a, the output of the detector 13 is 0 but when it comes to the position b, the beams incident from the respective photo detecting surfaces of the detector 13 become the signals corresponding to the current distributions. Thses are then inputted to respective amplifiers 14, from where they are sent to registers 18, 19 through an A/D converter 15, beam deflection control circuit 16, gate 17. The contents of a register 21 are subtracted in a subtractor 22 and the difference thereof is stored in a memory 23. Next, the similar operations also take place when the forming beam 11 comes to the position c, thus the current distribution of the forming beams 11 is obtained in the form of being divided to fine mesh form.
COPYRIGHT: (C)1979,JPO&Japio
JP6511478A 1978-05-31 1978-05-31 Beam intensity distribution measuring apparatus in electron beam apparatus Pending JPS54156683A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6511478A JPS54156683A (en) 1978-05-31 1978-05-31 Beam intensity distribution measuring apparatus in electron beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6511478A JPS54156683A (en) 1978-05-31 1978-05-31 Beam intensity distribution measuring apparatus in electron beam apparatus

Publications (1)

Publication Number Publication Date
JPS54156683A true JPS54156683A (en) 1979-12-10

Family

ID=13277534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6511478A Pending JPS54156683A (en) 1978-05-31 1978-05-31 Beam intensity distribution measuring apparatus in electron beam apparatus

Country Status (1)

Country Link
JP (1) JPS54156683A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5116982A (en) * 1974-06-14 1976-02-10 Cgr Mev

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5116982A (en) * 1974-06-14 1976-02-10 Cgr Mev

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