JPS5413269A - Forming method of two layer protective film - Google Patents

Forming method of two layer protective film

Info

Publication number
JPS5413269A
JPS5413269A JP7793177A JP7793177A JPS5413269A JP S5413269 A JPS5413269 A JP S5413269A JP 7793177 A JP7793177 A JP 7793177A JP 7793177 A JP7793177 A JP 7793177A JP S5413269 A JPS5413269 A JP S5413269A
Authority
JP
Japan
Prior art keywords
protective film
forming method
layer protective
photo resist
tupe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7793177A
Other languages
Japanese (ja)
Inventor
Kaoru Takeya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7793177A priority Critical patent/JPS5413269A/en
Publication of JPS5413269A publication Critical patent/JPS5413269A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To form the protective film of two layer constitution by one processing, by removing the positive type photo resist through taking the negative tupe photo resist as a mask.
COPYRIGHT: (C)1979,JPO&Japio
JP7793177A 1977-07-01 1977-07-01 Forming method of two layer protective film Pending JPS5413269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7793177A JPS5413269A (en) 1977-07-01 1977-07-01 Forming method of two layer protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7793177A JPS5413269A (en) 1977-07-01 1977-07-01 Forming method of two layer protective film

Publications (1)

Publication Number Publication Date
JPS5413269A true JPS5413269A (en) 1979-01-31

Family

ID=13647819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7793177A Pending JPS5413269A (en) 1977-07-01 1977-07-01 Forming method of two layer protective film

Country Status (1)

Country Link
JP (1) JPS5413269A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173437A (en) * 1991-08-01 1992-12-22 Chartered Semiconductor Manufacturing Pte Ltd Double polysilicon capacitor formation compatable with submicron processing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173437A (en) * 1991-08-01 1992-12-22 Chartered Semiconductor Manufacturing Pte Ltd Double polysilicon capacitor formation compatable with submicron processing

Similar Documents

Publication Publication Date Title
JPS5228875A (en) Mask
JPS5394770A (en) Photo mask
JPS5413269A (en) Forming method of two layer protective film
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS5373073A (en) Treatment method for photo resist
JPS51126073A (en) Pattern printing equpment made available by photo-etching method
JPS52143772A (en) Alignment method of masks using special reference marks
JPS52143769A (en) Removing method of positive type photo resist
JPS525270A (en) Photo-mask
JPS5429975A (en) Photo mask
JPS5399772A (en) Optical mask
JPS5314570A (en) Production of photo mask
JPS548978A (en) Manufacture of photto mask
JPS51146223A (en) Process for indicating the data of photograph
JPS5259574A (en) Production of lead frame for ic
JPS52156569A (en) Production of optical mask
JPS5429987A (en) Forming method of selective vapor-deposition film
JPS53126879A (en) Formation mathod of electrode wiring layer
JPS5382271A (en) Photo mask
JPS53127082A (en) Method of packaging
JPS522532A (en) Photosensitive composite for electro photography
JPS5397374A (en) Mask producing method
JPS5431281A (en) Optical exposure mask
JPS533821A (en) Exposure method
JPS5267270A (en) Photo etching method