JPS5370682A - Non-volatile semiconductor memory device - Google Patents
Non-volatile semiconductor memory deviceInfo
- Publication number
- JPS5370682A JPS5370682A JP14633576A JP14633576A JPS5370682A JP S5370682 A JPS5370682 A JP S5370682A JP 14633576 A JP14633576 A JP 14633576A JP 14633576 A JP14633576 A JP 14633576A JP S5370682 A JPS5370682 A JP S5370682A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor memory
- volatile semiconductor
- memory device
- decreasing
- recess
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Static Random-Access Memory (AREA)
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To shorten channel length without decreasing the dielectric strength of a non-volatile semiconductor memory suitable for high density integration by forming a recess in the channel region between source and drain regions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14633576A JPS5370682A (en) | 1976-12-06 | 1976-12-06 | Non-volatile semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14633576A JPS5370682A (en) | 1976-12-06 | 1976-12-06 | Non-volatile semiconductor memory device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5370682A true JPS5370682A (en) | 1978-06-23 |
Family
ID=15405351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14633576A Pending JPS5370682A (en) | 1976-12-06 | 1976-12-06 | Non-volatile semiconductor memory device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5370682A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1054453A2 (en) * | 1999-05-18 | 2000-11-22 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
US7026687B2 (en) | 2002-04-17 | 2006-04-11 | Fujitsu Limited | Non-volatile semiconductor memory and method of manufacturing the same |
JP2013131772A (en) * | 2006-12-15 | 2013-07-04 | Nec Corp | Nonvolatile storage device |
-
1976
- 1976-12-06 JP JP14633576A patent/JPS5370682A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1054453A2 (en) * | 1999-05-18 | 2000-11-22 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
EP1054453A3 (en) * | 1999-05-18 | 2002-04-17 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
US6563163B1 (en) | 1999-05-18 | 2003-05-13 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
US7026687B2 (en) | 2002-04-17 | 2006-04-11 | Fujitsu Limited | Non-volatile semiconductor memory and method of manufacturing the same |
JP2013131772A (en) * | 2006-12-15 | 2013-07-04 | Nec Corp | Nonvolatile storage device |
US8796129B2 (en) | 2006-12-15 | 2014-08-05 | Nec Corporation | Nonvolatile storage device and method for manufacturing the same in which insulating film is located between first and second impurity diffusion regions but absent on first impurity diffusion region |
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