JPS5353977A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5353977A
JPS5353977A JP12893276A JP12893276A JPS5353977A JP S5353977 A JPS5353977 A JP S5353977A JP 12893276 A JP12893276 A JP 12893276A JP 12893276 A JP12893276 A JP 12893276A JP S5353977 A JPS5353977 A JP S5353977A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
crystal plate
avert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12893276A
Other languages
Japanese (ja)
Other versions
JPS5346696B2 (en
Inventor
Hiroshi Yasuda
Haruo Tsuchikawa
Moritaka Nakamura
Yasutaka Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12893276A priority Critical patent/JPS5353977A/en
Publication of JPS5353977A publication Critical patent/JPS5353977A/en
Publication of JPS5346696B2 publication Critical patent/JPS5346696B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To avert the decrease in accuracy of rectangular holes by the vapor produced through heating by providing a rectangular hole on a semiconductor crystal plate, depositing metal layers on the front and back surfaces to form a diaphragm and shaping an electron beam while flowing current in the thickness direction of the crystal plate.
COPYRIGHT: (C)1978,JPO&Japio
JP12893276A 1976-10-27 1976-10-27 Electron beam exposure device Granted JPS5353977A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12893276A JPS5353977A (en) 1976-10-27 1976-10-27 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12893276A JPS5353977A (en) 1976-10-27 1976-10-27 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5353977A true JPS5353977A (en) 1978-05-16
JPS5346696B2 JPS5346696B2 (en) 1978-12-15

Family

ID=14996954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12893276A Granted JPS5353977A (en) 1976-10-27 1976-10-27 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5353977A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586129A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Electron beam exposing device
US5530519A (en) * 1992-06-30 1996-06-25 Noritsu Koki Co., Ltd. Method and apparatus for processing control strip

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586129A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Electron beam exposing device
US5530519A (en) * 1992-06-30 1996-06-25 Noritsu Koki Co., Ltd. Method and apparatus for processing control strip

Also Published As

Publication number Publication date
JPS5346696B2 (en) 1978-12-15

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