JPS5322383A - Iil simiconductor device - Google Patents

Iil simiconductor device

Info

Publication number
JPS5322383A
JPS5322383A JP9604276A JP9604276A JPS5322383A JP S5322383 A JPS5322383 A JP S5322383A JP 9604276 A JP9604276 A JP 9604276A JP 9604276 A JP9604276 A JP 9604276A JP S5322383 A JPS5322383 A JP S5322383A
Authority
JP
Japan
Prior art keywords
iil
making
delay time
epitaxial layer
impurity concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9604276A
Other languages
Japanese (ja)
Inventor
Mitsuo Usami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9604276A priority Critical patent/JPS5322383A/en
Publication of JPS5322383A publication Critical patent/JPS5322383A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE:To shorten the average gate delay time of an I<2>L and reduce power delay time product by making an epitaxial layer at a high impurity concentration as a whole and making only the base region of the lateral transistor which uses said epitaxial layer as its base at a low impurity concentration.
JP9604276A 1976-08-13 1976-08-13 Iil simiconductor device Pending JPS5322383A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9604276A JPS5322383A (en) 1976-08-13 1976-08-13 Iil simiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9604276A JPS5322383A (en) 1976-08-13 1976-08-13 Iil simiconductor device

Publications (1)

Publication Number Publication Date
JPS5322383A true JPS5322383A (en) 1978-03-01

Family

ID=14154423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9604276A Pending JPS5322383A (en) 1976-08-13 1976-08-13 Iil simiconductor device

Country Status (1)

Country Link
JP (1) JPS5322383A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339092A (en) * 1976-08-25 1978-04-10 Mitsubishi Electric Corp Semiconductor integrated circuit device
JPS5916368A (en) * 1982-07-19 1984-01-27 Matsushita Electronics Corp Bi-polar semiconductor device
JPS59146462U (en) * 1983-03-17 1984-09-29 日立建機株式会社 Self-propelled wall cutting device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339092A (en) * 1976-08-25 1978-04-10 Mitsubishi Electric Corp Semiconductor integrated circuit device
JPS5916368A (en) * 1982-07-19 1984-01-27 Matsushita Electronics Corp Bi-polar semiconductor device
JPS59146462U (en) * 1983-03-17 1984-09-29 日立建機株式会社 Self-propelled wall cutting device

Similar Documents

Publication Publication Date Title
JPS535585A (en) Semiconductor ic unit
JPS53121581A (en) Logical element of electrostatic inductive transistor
JPS5365078A (en) Production of junction type field effect transistor
JPS5382179A (en) Field effect transistor
JPS5322383A (en) Iil simiconductor device
JPS5376678A (en) Semiconductor device
JPS5376676A (en) High breakdown voltage field effect power transistor
JPS5338271A (en) Semiconductor device
JPS53105389A (en) Manufacture for insulating gate type semiconductor integrated circuit
JPS5380172A (en) Semiconductor device
JPS5220769A (en) Longitudinal semi-conductor unit
JPS538072A (en) Semiconductor device
JPS5366384A (en) Thyristor
JPS5333524A (en) Solid state pickup device
JPS51134074A (en) Method to manufacture the semiconductor unit
JPS545391A (en) Manufacture of semiconductor device
JPS5378177A (en) Field effect transistor
JPS5347278A (en) Insulated gate type field effect transistor
JPS5272580A (en) Production of semiconductor device
JPS51126772A (en) Electrolytic effect type semiconductor unit
JPS52124880A (en) Semiconductor device
JPS5521187A (en) Semiconductor device
JPS52123179A (en) Mos type semiconductor device and its production
JPS52146575A (en) Production of semiconductor device
JPS5382181A (en) Manufacture for semiconductor device