JPS5317279A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5317279A
JPS5317279A JP9140876A JP9140876A JPS5317279A JP S5317279 A JPS5317279 A JP S5317279A JP 9140876 A JP9140876 A JP 9140876A JP 9140876 A JP9140876 A JP 9140876A JP S5317279 A JPS5317279 A JP S5317279A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
junctions
diffusing
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9140876A
Other languages
Japanese (ja)
Inventor
Hitoshi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9140876A priority Critical patent/JPS5317279A/en
Publication of JPS5317279A publication Critical patent/JPS5317279A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0661Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body specially adapted for altering the breakdown voltage by removing semiconductor material at, or in the neighbourhood of, a reverse biased junction, e.g. by bevelling, moat etching, depletion etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To make shallow PN junctions by diffusing an impurity through the oxide film on semiconductor surface in a high temperature H2 atmosphere.
JP9140876A 1976-08-02 1976-08-02 Production of semiconductor device Pending JPS5317279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9140876A JPS5317279A (en) 1976-08-02 1976-08-02 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9140876A JPS5317279A (en) 1976-08-02 1976-08-02 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5317279A true JPS5317279A (en) 1978-02-17

Family

ID=14025544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9140876A Pending JPS5317279A (en) 1976-08-02 1976-08-02 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5317279A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135777U (en) * 1982-03-06 1983-09-12 エ−ア−ルシ−株式会社 pressure sensitive label structure
JPS59214884A (en) * 1983-05-20 1984-12-04 大阪シ−リング印刷株式会社 Label cassette
JPH0253394U (en) * 1988-10-07 1990-04-17
JPH0349938A (en) * 1989-07-18 1991-03-04 Houjiyu Insatsu:Kk Label making machine

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135777U (en) * 1982-03-06 1983-09-12 エ−ア−ルシ−株式会社 pressure sensitive label structure
JPS59214884A (en) * 1983-05-20 1984-12-04 大阪シ−リング印刷株式会社 Label cassette
JPH0259998B2 (en) * 1983-05-20 1990-12-14 Osaka Sealing Label Print
JPH0253394U (en) * 1988-10-07 1990-04-17
JPH0349938A (en) * 1989-07-18 1991-03-04 Houjiyu Insatsu:Kk Label making machine

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