JPS53135843A - Etching process for al and al alloy - Google Patents

Etching process for al and al alloy

Info

Publication number
JPS53135843A
JPS53135843A JP4997177A JP4997177A JPS53135843A JP S53135843 A JPS53135843 A JP S53135843A JP 4997177 A JP4997177 A JP 4997177A JP 4997177 A JP4997177 A JP 4997177A JP S53135843 A JPS53135843 A JP S53135843A
Authority
JP
Japan
Prior art keywords
alloy
etching process
pcl3
contg
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4997177A
Other languages
Japanese (ja)
Other versions
JPS5439263B2 (en
Inventor
Shinya Iida
Tatsumi Mizutani
Hideo Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4997177A priority Critical patent/JPS53135843A/en
Publication of JPS53135843A publication Critical patent/JPS53135843A/en
Publication of JPS5439263B2 publication Critical patent/JPS5439263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To efficiently etch Al (alloy) by a single process, by plasma etching it with PCl3 or a PCl3-contg. gas.
JP4997177A 1977-05-02 1977-05-02 Etching process for al and al alloy Granted JPS53135843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4997177A JPS53135843A (en) 1977-05-02 1977-05-02 Etching process for al and al alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4997177A JPS53135843A (en) 1977-05-02 1977-05-02 Etching process for al and al alloy

Publications (2)

Publication Number Publication Date
JPS53135843A true JPS53135843A (en) 1978-11-27
JPS5439263B2 JPS5439263B2 (en) 1979-11-27

Family

ID=12845894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4997177A Granted JPS53135843A (en) 1977-05-02 1977-05-02 Etching process for al and al alloy

Country Status (1)

Country Link
JP (1) JPS53135843A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5585670A (en) * 1978-12-23 1980-06-27 Fujitsu Ltd Aluminum and aluminum alloy etching method
JPS55107780A (en) * 1979-02-07 1980-08-19 Hitachi Ltd Etching method
JPS55134173A (en) * 1979-04-04 1980-10-18 Nippon Telegr & Teleph Corp <Ntt> Etching method for aluminum or aluminum base alloy
WO1982003636A1 (en) * 1981-04-15 1982-10-28 Mizutani Tatsumi Process for dry-etching aluminum or its alloy

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5585670A (en) * 1978-12-23 1980-06-27 Fujitsu Ltd Aluminum and aluminum alloy etching method
JPS5637305B2 (en) * 1978-12-23 1981-08-29
JPS55107780A (en) * 1979-02-07 1980-08-19 Hitachi Ltd Etching method
JPS5637306B2 (en) * 1979-02-07 1981-08-29
JPS55134173A (en) * 1979-04-04 1980-10-18 Nippon Telegr & Teleph Corp <Ntt> Etching method for aluminum or aluminum base alloy
WO1982003636A1 (en) * 1981-04-15 1982-10-28 Mizutani Tatsumi Process for dry-etching aluminum or its alloy

Also Published As

Publication number Publication date
JPS5439263B2 (en) 1979-11-27

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