JPS53113476A - Method for reduced pressure vapor growth - Google Patents

Method for reduced pressure vapor growth

Info

Publication number
JPS53113476A
JPS53113476A JP2847377A JP2847377A JPS53113476A JP S53113476 A JPS53113476 A JP S53113476A JP 2847377 A JP2847377 A JP 2847377A JP 2847377 A JP2847377 A JP 2847377A JP S53113476 A JPS53113476 A JP S53113476A
Authority
JP
Japan
Prior art keywords
reduced pressure
pressure vapor
vapor growth
substrates
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2847377A
Other languages
Japanese (ja)
Inventor
Yukinobu Tanno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2847377A priority Critical patent/JPS53113476A/en
Publication of JPS53113476A publication Critical patent/JPS53113476A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve flow of gas by opening a hole in part of substrates, inserting a bar therein to support the substrates and performing reduced pressure vapor growth.
JP2847377A 1977-03-14 1977-03-14 Method for reduced pressure vapor growth Pending JPS53113476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2847377A JPS53113476A (en) 1977-03-14 1977-03-14 Method for reduced pressure vapor growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2847377A JPS53113476A (en) 1977-03-14 1977-03-14 Method for reduced pressure vapor growth

Publications (1)

Publication Number Publication Date
JPS53113476A true JPS53113476A (en) 1978-10-03

Family

ID=12249607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2847377A Pending JPS53113476A (en) 1977-03-14 1977-03-14 Method for reduced pressure vapor growth

Country Status (1)

Country Link
JP (1) JPS53113476A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244030A (en) * 1984-05-17 1985-12-03 Fujitsu Ltd Horizontal furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244030A (en) * 1984-05-17 1985-12-03 Fujitsu Ltd Horizontal furnace

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