JPS541245A - Method of etching a1 and a1-based alloy - Google Patents
Method of etching a1 and a1-based alloyInfo
- Publication number
- JPS541245A JPS541245A JP6576977A JP6576977A JPS541245A JP S541245 A JPS541245 A JP S541245A JP 6576977 A JP6576977 A JP 6576977A JP 6576977 A JP6576977 A JP 6576977A JP S541245 A JPS541245 A JP S541245A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- based alloy
- percision
- circuitting
- undercutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To accomplish a high speed, percision etching without undercutting through sputter-etching of a photoresist-masked Al-evaporated plate for circuitting on a semi-conductive substrate with a gas containing boron trichloride.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6576977A JPS541245A (en) | 1977-06-06 | 1977-06-06 | Method of etching a1 and a1-based alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6576977A JPS541245A (en) | 1977-06-06 | 1977-06-06 | Method of etching a1 and a1-based alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS541245A true JPS541245A (en) | 1979-01-08 |
JPS556108B2 JPS556108B2 (en) | 1980-02-13 |
Family
ID=13296552
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6576977A Granted JPS541245A (en) | 1977-06-06 | 1977-06-06 | Method of etching a1 and a1-based alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS541245A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55107780A (en) * | 1979-02-07 | 1980-08-19 | Hitachi Ltd | Etching method |
JPS55115928A (en) * | 1979-02-27 | 1980-09-06 | Kawasaki Steel Corp | Production of non-aging cold rolled steel plate of excellent deep drawability |
JPS5726143A (en) * | 1980-07-25 | 1982-02-12 | Kawasaki Steel Corp | Cold rolled steel plate for pressing with very low intrasurface anisotropy and its manufacture |
US5356493A (en) * | 1992-07-08 | 1994-10-18 | Nkk Corporation | Blister-resistant steel sheet and method for producing thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
JPS5236979A (en) * | 1975-09-18 | 1977-03-22 | Itt | Method of etching |
JPS52123938A (en) * | 1976-04-13 | 1977-10-18 | Fujitsu Ltd | Spatter etching method |
-
1977
- 1977-06-06 JP JP6576977A patent/JPS541245A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
JPS5236979A (en) * | 1975-09-18 | 1977-03-22 | Itt | Method of etching |
JPS52123938A (en) * | 1976-04-13 | 1977-10-18 | Fujitsu Ltd | Spatter etching method |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55107780A (en) * | 1979-02-07 | 1980-08-19 | Hitachi Ltd | Etching method |
JPS5637306B2 (en) * | 1979-02-07 | 1981-08-29 | ||
JPS55115928A (en) * | 1979-02-27 | 1980-09-06 | Kawasaki Steel Corp | Production of non-aging cold rolled steel plate of excellent deep drawability |
US4339284A (en) * | 1979-02-27 | 1982-07-13 | Kawasaki Steel Corporation | Method of producing non-ageing cold rolled steel sheets |
JPS5849627B2 (en) * | 1979-02-27 | 1983-11-05 | 川崎製鉄株式会社 | Method for producing non-temporal cold-rolled steel sheet |
JPS5726143A (en) * | 1980-07-25 | 1982-02-12 | Kawasaki Steel Corp | Cold rolled steel plate for pressing with very low intrasurface anisotropy and its manufacture |
JPS61888B2 (en) * | 1980-07-25 | 1986-01-11 | Kawasaki Steel Co | |
US5356493A (en) * | 1992-07-08 | 1994-10-18 | Nkk Corporation | Blister-resistant steel sheet and method for producing thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS556108B2 (en) | 1980-02-13 |
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